发明授权
- 专利标题： Fluid handling structure, lithographic apparatus and device manufacturing method
- 专利标题（中）： 流体处理结构，光刻设备和器件制造方法
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申请号： US12437433申请日： 2009-05-07
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公开(公告)号： US08421993B2公开(公告)日： 2013-04-16
- 发明人: Daniel Jozef Maria Direcks , Danny Maria Hubertus Philips , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Paul Petrus Joannes Berkvens , Koen Steffens , Arnold Jan Van Putten
- 申请人： Daniel Jozef Maria Direcks , Danny Maria Hubertus Philips , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Paul Petrus Joannes Berkvens , Koen Steffens , Arnold Jan Van Putten
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.
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