Invention Grant
- Patent Title: Electron beam device
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Application No.: US11659145Application Date: 2005-07-28
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Publication No.: US08431894B2Publication Date: 2013-04-30
- Inventor: Erik Essers , Gerd Benner , Volker Drexel
- Applicant: Erik Essers , Gerd Benner , Volker Drexel
- Applicant Address: DE Jena
- Assignee: Carl Zeiss Microscopy GmbH
- Current Assignee: Carl Zeiss Microscopy GmbH
- Current Assignee Address: DE Jena
- Agency: Muirhead and Saturnelli, LLC
- Priority: DE102004037781 20040803
- International Application: PCT/EP2005/008216 WO 20050728
- International Announcement: WO2006/015732 WO 20060216
- Main IPC: G21K7/00
- IPC: G21K7/00

Abstract:
An electron beam device has an electron gun for generating an electron beam, an objective lens for focusing the electron beam on an object and at least one detector for detecting electrons emitted by the object or electrons backscattered by the object. Detection of electrons emitted by or backscattered by an object may be simplified and improved using quadrupole devices and certain configurations of these devices provided in the electron beam device.
Public/Granted literature
- US20090039257A1 Electron beam device Public/Granted day:2009-02-12
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