发明授权
US08435608B1 Methods of depositing smooth and conformal ashable hard mask films
有权
沉积光滑和保形的可硬化硬掩模膜的方法
- 专利标题: Methods of depositing smooth and conformal ashable hard mask films
- 专利标题(中): 沉积光滑和保形的可硬化硬掩模膜的方法
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申请号: US12163670申请日: 2008-06-27
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公开(公告)号: US08435608B1公开(公告)日: 2013-05-07
- 发明人: Pramod Subramonium , Zhiyuan Fang , Shawn Hancock , Mike Pierce , Jon Henri
- 申请人: Pramod Subramonium , Zhiyuan Fang , Shawn Hancock , Mike Pierce , Jon Henri
- 申请人地址: US CA Fremont
- 专利权人: Novellus Systems, Inc.
- 当前专利权人: Novellus Systems, Inc.
- 当前专利权人地址: US CA Fremont
- 代理机构: Weaver Austin Villeneuve & Sampson LLP
- 主分类号: H05H1/24
- IPC分类号: H05H1/24
摘要:
Provided are plasma enhanced chemical vapor deposition methods of depositing smooth and conformal ashable hard mask films on substrates containing raised or recessed features. The methods involve using precursors having relatively high C:H ratios, such as acetylene (C:H ratio of 1), and plasmas having low ion energies and fluxes. According to various embodiments, the methods involve depositing smooth ashable hard mask films using high frequency radio frequency-generated plasmas with no low frequency component and/or relatively high pressures (e.g., 2-5 Torr). Also provided are methods of depositing ashable hard mask films having good selectivity and improved side wall coverage and roughness. The methods involve depositing a first ashable hard mask film on a substrate having a feature using a process optimized for selectivity and/or optical properties and then depositing a smoothing layer on the first ashable hard mask film using an HF-only process.
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