- 专利标题： Cyclic carbosilane dielectric films
-
申请号： US12978385申请日： 2010-12-23
-
公开(公告)号： US08441006B2公开(公告)日： 2013-05-14
- 发明人: David J. Michalak , James M. Blackwell , James S. Clarke
- 申请人： David J. Michalak , James M. Blackwell , James S. Clarke
- 申请人地址： US CA Santa Clara
- 专利权人： Intel Corporation
- 当前专利权人： Intel Corporation
- 当前专利权人地址： US CA Santa Clara
- 代理商 Julia A. Hodge
- 主分类号： H01L51/00
- IPC分类号： H01L51/00
摘要：
Embodiments of the invention provide dielectric films and low-k dielectric films and methods for making dielectric and low-k dielectric films. Dielectric films are made from carbosilane-containing precursors. In embodiments of the invention, dielectric film precursors comprise attached porogen molecules. In further embodiments, dielectric films have nanometer-dimensioned pores.
公开/授权文献
- US20120161295A1 CYCLIC CARBOSILANE DIELECTRIC FILMS 公开/授权日：2012-06-28
信息查询
IPC分类:
