Invention Grant
- Patent Title: Cyclic carbosilane dielectric films
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Application No.: US12978385Application Date: 2010-12-23
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Publication No.: US08441006B2Publication Date: 2013-05-14
- Inventor: David J. Michalak , James M. Blackwell , James S. Clarke
- Applicant: David J. Michalak , James M. Blackwell , James S. Clarke
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agent Julia A. Hodge
- Main IPC: H01L51/00
- IPC: H01L51/00
Abstract:
Embodiments of the invention provide dielectric films and low-k dielectric films and methods for making dielectric and low-k dielectric films. Dielectric films are made from carbosilane-containing precursors. In embodiments of the invention, dielectric film precursors comprise attached porogen molecules. In further embodiments, dielectric films have nanometer-dimensioned pores.
Public/Granted literature
- US20120161295A1 CYCLIC CARBOSILANE DIELECTRIC FILMS Public/Granted day:2012-06-28
Information query
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