发明授权
- 专利标题： Imprint pattern forming method
- 专利标题（中）： 印记图案形成方法
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申请号： US12726503申请日： 2010-03-18
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公开(公告)号： US08444889B2公开(公告)日： 2013-05-21
- 发明人: Hiroshi Tokue , Ikuo Yoneda , Ryoichi Inanami
- 申请人： Hiroshi Tokue , Ikuo Yoneda , Ryoichi Inanami
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- 优先权： JP2009-073897 20090325
- 主分类号： B29C59/02
- IPC分类号： B29C59/02 ; G01B11/10
摘要：
An imprint pattern forming method includes contacting a template with a pattern in a front surface with an imprint material formed in a substrate to fill the imprint material into the pattern, curing the imprint material filled in the pattern to form an imprint material pattern, and after forming the imprint material pattern, separating the template from the imprint material pattern while applying pressure to the back surface of the template.
公开/授权文献
- US20100244326A1 IMPRINT PATTERN FORMING METHOD 公开/授权日：2010-09-30
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