发明授权
US08445966B2 Method and apparatus for protection against process-induced charging
有权
用于防止过程引起的充电的方法和装置
- 专利标题: Method and apparatus for protection against process-induced charging
- 专利标题(中): 用于防止过程引起的充电的方法和装置
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申请号: US11614053申请日: 2006-12-20
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公开(公告)号: US08445966B2公开(公告)日: 2013-05-21
- 发明人: David M. Rogers , Mimi X. Qian , Kwadwo A. Appiah , Mark Randolph , Michael A. VanBuskirk , Tazrien Kamal , Hiroyuki Kinoshita , Yi He , Wei Zheng
- 申请人: David M. Rogers , Mimi X. Qian , Kwadwo A. Appiah , Mark Randolph , Michael A. VanBuskirk , Tazrien Kamal , Hiroyuki Kinoshita , Yi He , Wei Zheng
- 申请人地址: US CA Sunnyvale
- 专利权人: Spansion LLC
- 当前专利权人: Spansion LLC
- 当前专利权人地址: US CA Sunnyvale
- 主分类号: H01L23/62
- IPC分类号: H01L23/62
摘要:
A semiconductor device (400) for improved charge dissipation protection includes a substrate (426), a layer of semiconductive or conductive material (406), one or more thin film devices (408) and a charge passage device (414). The thin film devices (408) are connected to the semiconductive or conductive layer (406) and the charge passage device (414) is coupled to the thin film devices (408) and to the substrate (426) and provides a connection from the thin film devices (408) to the substrate (426) to dissipate charge from the semiconductive/conductive layer (406) to the substrate (426).
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