发明授权
US08450823B2 Integrated circuit with grating and manufacturing method therefor 有权
具有光栅的集成电路及其制造方法

  • 专利标题: Integrated circuit with grating and manufacturing method therefor
  • 专利标题(中): 具有光栅的集成电路及其制造方法
  • 申请号: US13119370
    申请日: 2009-09-12
  • 公开(公告)号: US08450823B2
    公开(公告)日: 2013-05-28
  • 发明人: Erwin HijzenMagali Lambert
  • 申请人: Erwin HijzenMagali Lambert
  • 申请人地址: NL Eindhoven
  • 专利权人: NXP B.V.
  • 当前专利权人: NXP B.V.
  • 当前专利权人地址: NL Eindhoven
  • 优先权: EP08105358 20080916
  • 国际申请: PCT/IB2009/053994 WO 20090912
  • 国际公布: WO2010/032187 WO 20100325
  • 主分类号: H01L31/0232
  • IPC分类号: H01L31/0232 H01L21/00
Integrated circuit with grating and manufacturing method therefor
摘要:
Disclosed is an integrated circuit (100) comprising a substrate (110) carrying a plurality of light-sensitive elements (112) and a blazed grating (120) comprising a plurality of diffractive elements (122) for diffracting respective spectral components (123-125) of incident light (150) to respective light-sensitive elements (112), the blazed grating (120) comprising a stack of layers, at least some of these layers comprising first portions, e.g. metal portions (202, 222, 242) arranged such that each diffractive element (122) comprises a stepped profile of stacked first portions with a first portion in a higher layer laterally extending beyond a first portion in a lower layer of said stepped profile.
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