发明授权
- 专利标题: Foreign substance removing apparatus, foreign substance removing method, and storage medium
- 专利标题(中): 异物去除装置,异物去除方法和存储介质
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申请号: US12635107申请日: 2009-12-10
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公开(公告)号: US08454752B2公开(公告)日: 2013-06-04
- 发明人: Masaki Kondo , Takehiro Shindou
- 申请人: Masaki Kondo , Takehiro Shindou
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Rothwell, Figg, Ernst & Manbeck, P.C.
- 优先权: JP2008-318237 20081215
- 主分类号: B08B5/00
- IPC分类号: B08B5/00
摘要:
A foreign substance removing apparatus includes a mounting table for mounting and rotating a substrate; and a laser beam irradiation unit for removing foreign substances attached to a surface of the substrate by irradiating foreign substance cleaning laser beam onto the substrate mounted and rotated on the mounting table. In the foreign substance removing apparatus, the laser beam irradiation unit irradiates laser beam having an elongate shaped irradiation cross section onto the surface of the substrate.
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