发明授权
US08456891B2 Nonvolatile memory cells having oxygen diffusion barrier layers therein
有权
其中具有氧扩散阻挡层的非易失性存储单元
- 专利标题: Nonvolatile memory cells having oxygen diffusion barrier layers therein
- 专利标题(中): 其中具有氧扩散阻挡层的非易失性存储单元
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申请号: US13150596申请日: 2011-06-01
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公开(公告)号: US08456891B2公开(公告)日: 2013-06-04
- 发明人: In-gyu Baek , Myung-jong Kim , Yong-ho Ha
- 申请人: In-gyu Baek , Myung-jong Kim , Yong-ho Ha
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Myers Bigel Sibley & Sajovec, P.A.
- 优先权: KR10-2010-0051963 20100601
- 主分类号: G11C11/00
- IPC分类号: G11C11/00 ; H01L45/00
摘要:
A nonvolatile memory cell includes first and second electrodes and a data storage layer extending between the first and second electrodes. An oxygen diffusion barrier layer is provided, which extends between the data storage layer and the first electrode. An oxygen gettering layer is also provided, which extends between the oxygen diffusion barrier layer and the data storage layer. The oxygen diffusion barrier layer includes aluminum oxide, the oxygen gettering layer includes titanium, the data storage layer includes a metal oxide, such as magnesium oxide, and at least one of the first and second electrodes includes a material selected from a group consisting of tungsten, polysilicon, aluminum, titanium nitride silicide and conductive nitrides.
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