Invention Grant
US08456891B2 Nonvolatile memory cells having oxygen diffusion barrier layers therein
有权
其中具有氧扩散阻挡层的非易失性存储单元
- Patent Title: Nonvolatile memory cells having oxygen diffusion barrier layers therein
- Patent Title (中): 其中具有氧扩散阻挡层的非易失性存储单元
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Application No.: US13150596Application Date: 2011-06-01
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Publication No.: US08456891B2Publication Date: 2013-06-04
- Inventor: In-gyu Baek , Myung-jong Kim , Yong-ho Ha
- Applicant: In-gyu Baek , Myung-jong Kim , Yong-ho Ha
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR10-2010-0051963 20100601
- Main IPC: G11C11/00
- IPC: G11C11/00 ; H01L45/00

Abstract:
A nonvolatile memory cell includes first and second electrodes and a data storage layer extending between the first and second electrodes. An oxygen diffusion barrier layer is provided, which extends between the data storage layer and the first electrode. An oxygen gettering layer is also provided, which extends between the oxygen diffusion barrier layer and the data storage layer. The oxygen diffusion barrier layer includes aluminum oxide, the oxygen gettering layer includes titanium, the data storage layer includes a metal oxide, such as magnesium oxide, and at least one of the first and second electrodes includes a material selected from a group consisting of tungsten, polysilicon, aluminum, titanium nitride silicide and conductive nitrides.
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