发明授权
US08475998B2 Compound synthesis method, microarray, acid-transfer composition, and biochip composition
有权
复合合成方法，微阵列，酸转移组合物和生物芯片组成
- 专利标题： Compound synthesis method, microarray, acid-transfer composition, and biochip composition
- 专利标题（中）： 复合合成方法，微阵列，酸转移组合物和生物芯片组成
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申请号： US13329619申请日： 2011-12-19
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公开(公告)号： US08475998B2公开(公告)日： 2013-07-02
- 发明人: Hyojin Yun , Changeun Yoo , Myung-Sun Kim , Soo-Kyung Kim , Kouji Nishikawa , Hirofumi Goto , Hidetoshi Miyamoto
- 申请人： Hyojin Yun , Changeun Yoo , Myung-Sun Kim , Soo-Kyung Kim , Kouji Nishikawa , Hirofumi Goto , Hidetoshi Miyamoto
- 申请人地址： KR Hwasung JP Tokyo
- 专利权人： Samsung Electronics Co., Ltd.,JSR Corporation
- 当前专利权人： Samsung Electronics Co., Ltd.,JSR Corporation
- 当前专利权人地址： KR Hwasung JP Tokyo
- 代理机构： Ditthavong Mori & Steiner, P.C.
- 优先权： JP2010-283611 20101220
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/004 ; G03F7/07 ; G03F7/11 ; C40B40/04 ; C40B40/06 ; C40B40/08 ; C40B40/10 ; C40B40/12
摘要：
A compound synthesis method includes bonding a first compound to a substrate to form a first film. A second film is formed on the first film using an acid-transfer composition including (A) a polymer that includes a structural unit shown by a following formula (1) and a structural unit shown by a following formula (2), (B) a photoacid generator shown by a following formula (3), and (C) a sensitizer shown by a following formula (4). The second film is exposed to remove the protecting group from the first compound under an exposed area of the second film. An acid generated in the exposed area of the second film is transferred to the first film. The second film after being exposed is removed. A second compound is bonded to the first compound from which the protecting group has been removed.
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