Invention Grant
- Patent Title: Rigid dual-servo nano stage
- Patent Title (中): 刚性双伺服纳米级
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Application No.: US13054683Application Date: 2009-04-17
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Publication No.: US08476807B2Publication Date: 2013-07-02
- Inventor: Eun Goo Kang , Young Jae Choi , Seok Woo Lee , Sang Moo Lee , Kyung Tae Nam , Sang Hoon Ji
- Applicant: Eun Goo Kang , Young Jae Choi , Seok Woo Lee , Sang Moo Lee , Kyung Tae Nam , Sang Hoon Ji
- Applicant Address: KR Cheonan-si, Chungnam
- Assignee: Korea Institute of Industrial Technology
- Current Assignee: Korea Institute of Industrial Technology
- Current Assignee Address: KR Cheonan-si, Chungnam
- Agency: Sherr & Jiang, PLLC
- Priority: KR10-2008-0041204 20080502
- International Application: PCT/KR2009/002015 WO 20090417
- International Announcement: WO2009/134031 WO 20091105
- Main IPC: H01L41/083
- IPC: H01L41/083

Abstract:
The present invention relates to a stage, particularly to, a stage which is able to move minutely, having a rigidity-improved transfer part. A stage includes a work table on which a working object is placed, a motor configured to provide a rotational force, a shaft rotated by the motor to transfer the work table, a linear moving part configured to be expandable to linearly move the shaft in an axial direction, the linear moving part having a hollow to insert an end of the shaft therein, and an expanding part configured to be expandable as far as the shaft is moved by the linear moving part.
Public/Granted literature
- US20110181151A1 RIGID DUAL-SERVO NANO STAGE Public/Granted day:2011-07-28
Information query
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