Invention Grant
- Patent Title: Distance metric for accurate lithographic hotspot classification using radial and angular functions
- Patent Title (中): 使用径向和角度函数的精确光刻热点分类的距离度量
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Application No.: US13487047Application Date: 2012-06-01
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Publication No.: US08490030B1Publication Date: 2013-07-16
- Inventor: Charles C. Chiang , Jing Guo , Fan Yang , Subarnarekha Sinha , Xuan Zeng
- Applicant: Charles C. Chiang , Jing Guo , Fan Yang , Subarnarekha Sinha , Xuan Zeng
- Applicant Address: US CA Mountain View
- Assignee: Synopsys, Inc.
- Current Assignee: Synopsys, Inc.
- Current Assignee Address: US CA Mountain View
- Agency: Bever, Hoffman & Harms, LLP
- Agent Jeanette S. Harms
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
An dual function distance metric for pattern matching based hotspot clustering is described. The dual function distance metric can handle patterns containing multiple polygons, is easy to compute, and is tolerant of small variations or shifts of the shapes. Compared with an XOR distance metric pattern clustering, the dual function distance metric can achieve up to 37.5% accuracy improvement with 2X-4X computational cost in the context of cluster analysis. The dual function distance metric is reliable and accurate for characterizing clips (e.g. hotspots), thereby making it desirable for industry applications.
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