发明授权
- 专利标题： Optical recording material, optical recording method, photosensitive material and method
- 专利标题（中）： 光记录材料，光记录方法，感光材料及方法
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申请号： US12735579申请日： 2009-01-28
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公开(公告)号： US08518631B2公开(公告)日： 2013-08-27
- 发明人: Katsumasa Fujita , Minoru Kobayashi , Kazuya Kikuchi , Shin Mizukami , Satoshi Kawata , Shogo Kawano
- 申请人： Katsumasa Fujita , Minoru Kobayashi , Kazuya Kikuchi , Shin Mizukami , Satoshi Kawata , Shogo Kawano
- 申请人地址： JP Suita-shi, Osaka JP Osaka-shi, Osaka
- 专利权人： Osaka University,Nanophoton Corporation
- 当前专利权人： Osaka University,Nanophoton Corporation
- 当前专利权人地址： JP Suita-shi, Osaka JP Osaka-shi, Osaka
- 代理机构： McGinn IP Law Group, PLLC
- 优先权： JP2008-018665 20080130
- 国际申请： PCT/JP2009/051373 WO 20090128
- 国际公布： WO2009/096432 WO 20090806
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G11B7/24 ; G03C1/73
摘要：
Provided is a nonlinear optical material, an optical recording material, an optical recording method, a photosensitive material, a photopolymerization initiator, and a photosensitizer. One exemplary aspect of the present invention is a photosensitive material used for photolithography for forming a pattern by irradiating a photoresist with excitation light which includes a donor molecule 11 that is excited by the excitation light, and an acceptor molecule 12 that is excited by energy transfer or charge transfer from the excited donor 11.
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