Invention Grant
- Patent Title: Doped aluminum oxides
- Patent Title (中): 掺杂的氧化铝
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Application No.: US13321146Application Date: 2011-04-15
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Publication No.: US08524178B2Publication Date: 2013-09-03
- Inventor: S. Sundar Manoharan
- Applicant: S. Sundar Manoharan
- Applicant Address: IN Kanpur
- Assignee: Indian Institute of Technology Kanpur
- Current Assignee: Indian Institute of Technology Kanpur
- Current Assignee Address: IN Kanpur
- Agency: Foley & Lardner LLP
- Priority: IN385/DEL/2011 20110214
- International Application: PCT/IB2011/051642 WO 20110415
- International Announcement: WO2012/110858 WO 20120823
- Main IPC: C01F1/00
- IPC: C01F1/00 ; C01F3/00 ; C01F7/00 ; C01F15/00 ; C09K11/02 ; C09K11/08 ; C09K11/77 ; C04B35/00

Abstract:
A process of preparing a doped aluminum oxide, includes providing a solution comprising 8-hydroxyquinoline; an aluminum precursor; a dopant precursor, and a reaction solvent; isolating a precipitate from the solution; and calcining the precipitate to form the doped aluminum oxide. Compositions may be prepared which include tris(8-hydroxyquinolinato) aluminum and (8-hydroxyquinolinato)zM, wherein M is a metal ion and the value of z is equivalent to the oxidation state of the metal ion.
Public/Granted literature
- US20130009098A1 DOPED ALUMINUM OXIDES Public/Granted day:2013-01-10
Information query
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