发明授权
- 专利标题: Germanium compound, semiconductor device fabricated using the same, and methods of forming the same
- 专利标题(中): 锗化合物,使用其制造的半导体器件及其形成方法
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申请号: US11777854申请日: 2007-07-13
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公开(公告)号: US08525244B2公开(公告)日: 2013-09-03
- 发明人: Hye-Young Park , Myong-Woon Kim , Jin-Dong Kim , Choong-Man Lee , Jin-Il Lee
- 申请人: Hye-Young Park , Myong-Woon Kim , Jin-Dong Kim , Choong-Man Lee , Jin-Il Lee
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Myers Bigel Sibley & Sajovec PA
- 优先权: KR10-2006-0065987 20060713
- 主分类号: H01L27/108
- IPC分类号: H01L27/108
摘要:
A germanium (Ge) compound is provided. The Ge compound has a chemical formula GeR1xR2y. “R1” is an alkyl group, and “R2” is one of hydrogen, amino group, allyl group and vinyl group. “x” is greater than zero and less than 4, and the sum of “x” and “y” is equal to 4. Methods of forming the Ge compound, methods of fabricating a phase change memory device using the Ge compound, and phase change memory devices fabricated using the Ge compound are also provided.
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