Invention Grant
- Patent Title: Lithographic apparatus with cleaning of substrate table
- Patent Title (中): 平版印刷设备，具有清洁基片台
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Application No.: US11767441Application Date: 2007-06-22
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Publication No.: US08525971B2Publication Date: 2013-09-03
- Inventor: Kenichi Shiraishi
- Applicant: Kenichi Shiraishi
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2004-171115 20040609
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
There is provided an exposure apparatus capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus (EX), which forms a liquid immersion area (AR2) of a liquid (LQ) on an image surface side of a projection optical system (PL), and exposes a substrate (P) via the projection optical system (PL) and the liquid (LQ) of the immersion area (AR2), is provided with a measuring device (60) which measures at least one of a property and composition of the liquid (LQ) for forming the liquid immersion area (AR2).
Public/Granted literature
- US20070242247A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2007-10-18
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