Invention Grant
- Patent Title: Method for manufacturing non-volatile magnetic memory
- Patent Title (中): 制造非易失性磁记忆体的方法
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Application No.: US12040827Application Date: 2008-02-29
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Publication No.: US08535952B2Publication Date: 2013-09-17
- Inventor: Rajiv Yadav Ranjan , Parviz Keshtbod , Roger Klas Malmhall
- Applicant: Rajiv Yadav Ranjan , Parviz Keshtbod , Roger Klas Malmhall
- Applicant Address: US CA Fremont
- Assignee: Avalanche Technology, Inc.
- Current Assignee: Avalanche Technology, Inc.
- Current Assignee Address: US CA Fremont
- Agency: IPxLAW Group LLP
- Agent Maryam Imam
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
In accordance with a method of the present invention, a method of manufacturing a magnetic random access memory (MRAM) cell and a corresponding structure thereof are disclosed to include a multi-stage manufacturing process. The multi-stage manufacturing process includes performing a front end on-line (FEOL) stage to manufacture logic and non-magnetic portions of the memory cell by forming an intermediate interlayer dielectric (ILD) layer, forming intermediate metal pillars embedded in the intermediate ILD layer, depositing a conductive metal cap on top of the intermediate ILD layer and the metal pillars, performing magnetic fabrication stage to make a magnetic material portion of the memory cell being manufactured, and performing back end on-line (BEOL) stage to make metal and contacts of the memory cell being manufactured.
Public/Granted literature
- US20080293165A1 METHOD FOR MANUFACTURING NON-VOLATILE MAGNETIC MEMORY Public/Granted day:2008-11-27
Information query
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