Invention Grant
- Patent Title: Photoacid generator, chemically amplified resist composition including the same, and associated methods
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Application No.: US12285047Application Date: 2008-09-29
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Publication No.: US08536347B2Publication Date: 2013-09-17
- Inventor: Yool Kang , Hak-won Kim , Weoun-ju Kim , Seong-woon Choi , Hyun-woo Kim , Hai-sub Na , Kyoung-taek Kim
- Applicant: Yool Kang , Hak-won Kim , Weoun-ju Kim , Seong-woon Choi , Hyun-woo Kim , Hai-sub Na , Kyoung-taek Kim
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2007-0098405 20070928
- Main IPC: C07D339/00
- IPC: C07D339/00 ; C07D335/00

Abstract:
A photoacid generator represented by Formula 1 or Formula 2: wherein R1, R2, and R3 are each independently a C1-C10 alkyl group, X is a C3-C20 alicyclic hydrocarbon group forming a ring with S+, and at least one CH2 group in the alicyclic hydrocarbon group may be replaced with at least one selected from the group consisting of S, O, NH, a carbonyl group, and R5—S+A−, where R5 is a C1-C10 alkyl group, and A− is a counter-ion.
Public/Granted literature
- US20090131684A1 Photoacid generator, chemically amplified resist composition including the same, and associated methods Public/Granted day:2009-05-21
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