公开(公告)号：US08536347B2

公开(公告)日：2013-09-17

申请号：US12285047

申请日：2008-09-29

申请人： Yool Kang ,  Hak-won Kim ,  Weoun-ju Kim ,  Seong-woon Choi ,  Hyun-woo Kim ,  Hai-sub Na ,  Kyoung-taek Kim

发明人： Yool Kang ,  Hak-won Kim ,  Weoun-ju Kim ,  Seong-woon Choi ,  Hyun-woo Kim ,  Hai-sub Na ,  Kyoung-taek Kim

IPC分类号： C07D339/00 ,  C07D335/00

CPC分类号： G03F7/0045 ,  C07C309/65 ,  C07C381/12 ,  C07D327/06 ,  C07D333/46 ,  C07D335/02 ,  C07D339/08 ,  G03F7/0392

摘要： A photoacid generator represented by Formula 1 or Formula 2: wherein R1, R2, and R3 are each independently a C1-C10 alkyl group, X is a C3-C20 alicyclic hydrocarbon group forming a ring with S+, and at least one CH2 group in the alicyclic hydrocarbon group may be replaced with at least one selected from the group consisting of S, O, NH, a carbonyl group, and R5—S+A−, where R5 is a C1-C10 alkyl group, and A− is a counter-ion.

公开(公告)号：US20090131684A1

公开(公告)日：2009-05-21

申请号：US12285047

申请日：2008-09-29

申请人： Yool Kang ,  Hak-won Kim ,  Weoun-ju Kim ,  Seong-woon Choi ,  Hyun-woo Kim ,  Hai-sub Na ,  Kyoung-taek Kim

发明人： Yool Kang ,  Hak-won Kim ,  Weoun-ju Kim ,  Seong-woon Choi ,  Hyun-woo Kim ,  Hai-sub Na ,  Kyoung-taek Kim

IPC分类号： C07D339/08 ,  C07C309/04 ,  C07D333/46 ,  C07D335/02

CPC分类号： G03F7/0045 ,  C07C309/65 ,  C07C381/12 ,  C07D327/06 ,  C07D333/46 ,  C07D335/02 ,  C07D339/08 ,  G03F7/0392

摘要： A photoacid generator represented by Formula 1 or Formula 2: wherein R1, R2, and R3 are each independently a C1-C10 alkyl group, X is a C3-C20 alicyclic hydrocarbon group forming a ring with S+, and at least one CH2 group in the alicyclic hydrocarbon group may be replaced with at least one selected from the group consisting of S, O, NH, a carbonyl group, and R5—S+A−, where R5 is a C1-C10 alkyl group, and A− is a counter-ion.

摘要翻译： 由式1或式2表示的光酸产生剂：其中R1，R2和R3各自独立地为C1-C10烷基，X为与S +形成环的C 3 -C 20脂环族烃基和至少一个CH 2基团 脂环族烃基可以被选自S，O，NH，羰基和R5-S + A-中的至少一种取代，其中R5是C1-C10烷基，A-是 抗衡离子。

公开(公告)号：US20120021355A1

公开(公告)日：2012-01-26

申请号：US13188670

申请日：2011-07-22

申请人： Hyun-woo Kim ,  Hai-sub Na ,  Chil-hee Chung ,  Han-ku Cho

发明人： Hyun-woo Kim ,  Hai-sub Na ,  Chil-hee Chung ,  Han-ku Cho

IPC分类号： H01L21/311 ,  G03F7/039 ,  G03F7/26 ,  G02B5/22 ,  H01L21/02

CPC分类号： G03F7/0388 ,  G02B5/208 ,  G02B5/22 ,  G03F7/095 ,  G03F7/11

摘要： Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/μm or greater with respect to 193-nm incident light.

摘要翻译： 提供了一种在极紫外（EUV）暴露期间用于深紫外（DUV）过滤的涂料组合物，该涂料组合物包括约100重量份的包含第一溶剂（第一溶剂为醇溶剂）的溶剂; 和约0.05重量份至约5重量份的相对于193纳米入射光的吸收度为约50％/μm或更大的涂层聚合物。

公开(公告)号：US08715911B2

公开(公告)日：2014-05-06

申请号：US13188670

申请日：2011-07-22

申请人： Hyun-woo Kim ,  Hai-sub Na ,  Chil-hee Chung ,  Han-ku Cho

发明人： Hyun-woo Kim ,  Hai-sub Na ,  Chil-hee Chung ,  Han-ku Cho

IPC分类号： G06F7/26

CPC分类号： G03F7/0388 ,  G02B5/208 ,  G02B5/22 ,  G03F7/095 ,  G03F7/11

摘要： Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/μm or greater with respect to 193-nm incident light.