发明授权
- 专利标题: Semiconductor device having stacked structural bodies and method for manufacturing the same
- 专利标题(中): 具有层叠结构体的半导体装置及其制造方法
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申请号: US13118402申请日: 2011-05-28
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公开(公告)号: US08541768B2公开(公告)日: 2013-09-24
- 发明人: Akio Shima , Yoshitska Sasago , Toshiyuki Mine , Masaharu Kinoshita
- 申请人: Akio Shima , Yoshitska Sasago , Toshiyuki Mine , Masaharu Kinoshita
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Miles & Stockbridge P.C.
- 优先权: JP2010-126983 20100602
- 主分类号: H01L29/02
- IPC分类号: H01L29/02
摘要:
A technique used for a semiconductor device formed by stacking multiple structural bodies each having a semiconductor device, for preventing generation of thermal load on a structural body at a lower layer which is caused by a laser used in a step of forming a structural body at an upper layer. In a phase-change memory including multiple stacked memory matrices, a metal film is disposed between a memory matrix at a lower layer and a memory matrix at an upper layer formed over the memory matrix at the lower layer, in which the laser used for forming the memory matrix is reflected at the metal film and prevented from transmitting the metal film, thereby preventing the phase-change material layer, etc. in the memory matrix at the lower layer from being directly heated excessively by the laser.
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