Invention Grant
US08544317B2 Semiconductor processing apparatus with simultaneously movable stages 有权
半导体处理装置具有同步可动级

Semiconductor processing apparatus with simultaneously movable stages
Abstract:
A method and apparatus provide for simultaneously moving multiple semiconductor wafers in opposite directions while simultaneously performing processing operations on each of the wafers. The semiconductor wafers are orientated in coplanar fashion and are disposed on stages that simultaneously translate in opposite directions to produce a net system momentum of zero. The die of the respective semiconductor wafers are processed in the same spatial sequence with respect to a global alignment feature of the semiconductor wafer. A balance mass is not needed to counteract the motion of a stage because the opposite motions of the respective stages cancel each other.
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