发明授权
- 专利标题： Nickel alloy target including a secondary metal
- 专利标题（中）： 镍合金靶包括二次金属
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申请号： US13188182申请日： 2011-07-21
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公开(公告)号： US08551193B2公开(公告)日： 2013-10-08
- 发明人: Shih-Chieh Chang , Ying-Lang Wang , Kei-Wei Chen
- 申请人： Shih-Chieh Chang , Ying-Lang Wang , Kei-Wei Chen
- 申请人地址： TW Hsin-Chu
- 专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址： TW Hsin-Chu
- 代理机构： Slater & Matsil, L.L.P.
- 主分类号： C22C19/03
- IPC分类号： C22C19/03 ; H01L21/283
摘要：
A target includes nickel and a secondary metal. The secondary metal has a volume percentage between about 1 percent and about 10 percent. The secondary metal has a density between about 5,000 kg/m3 and about 15,000 kg/m3.
公开/授权文献
- US20130020617A1 Nickel Alloy Target Including a Secondary Metal 公开/授权日：2013-01-24