发明授权
- 专利标题： Lithographic apparatus, coverplate and device manufacturing method
- 专利标题（中）： 平版印刷设备，盖板和装置制造方法
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申请号： US12881878申请日： 2010-09-14
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公开(公告)号： US08553206B2公开(公告)日： 2013-10-08
- 发明人: Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Laurentius Johannes Adrianus Van Bokhoven , Henricus Jozef Castelijns
- 申请人： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Laurentius Johannes Adrianus Van Bokhoven , Henricus Jozef Castelijns
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/58
- IPC分类号： G03B27/58 ; G03B27/32
摘要：
A lithographic apparatus, including a substrate table configured to hold a substrate; a positioner configured to position the substrate table relative to a projection system, the positioner including a short stroke module configured to perform fine positioning movements, on which the substrate table is held and which is supported on a long stroke module configured to perform coarse positioning movements; and a coverplate configured to at least partly cover a top surface of the short stroke module; wherein the coverplate is mounted to the long stroke module.
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