The present invention relates to a glass product, comprising a glass substrate with a transparent and conductive indium tin oxide layer having a covering layer, which forms a redox barrier for the indium tin oxide layer, wherein the indium tin oxide layer is obtained by pulsed, highly ionizing high-power magnetron sputtering (HPPMS) in which—the pulses of the magnetron have a peak power density greater than 1.5 kW/cm2,—the pulses of the magnetron have a time duration that is ≦200 μs, and—the mean current flow density rise upon ignition of the plasma within a time interval that is ≦0.025 ms is at least 106 Λ(ms cm2), and the indium tin oxide layer has a crystalline structure, in such a way that the (222)-reflection of an X-ray diffraction spectrum after the production of the indium tin oxide layer is shifted relative to the powder spectrum of indium tin oxide by a maximum of 1 degree, preferably by 0.3 degrees to 0.5 degrees, in the direction of compressive stress and is shifted after heat treatment by a maximum of 1 degree, preferably by 0.2 degrees to 0.4 degrees, in the direction of the powder spectrum.