Invention Grant
- Patent Title: Vertical film formation apparatus and method for using same
- Patent Title (中): 垂直成膜装置及其使用方法
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Application No.: US12954767Application Date: 2010-11-26
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Publication No.: US08563096B2Publication Date: 2013-10-22
- Inventor: Masanobu Matsunaga , Pao-Hwa Chou , Masato Yonezawa , Masayuki Hasegawa , Kazuhide Hasebe
- Applicant: Masanobu Matsunaga , Pao-Hwa Chou , Masato Yonezawa , Masayuki Hasegawa , Kazuhide Hasebe
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-269830 20091127; JP2010-241831 20101028
- Main IPC: C23C16/02
- IPC: C23C16/02 ; H05H1/24

Abstract:
A method for using a vertical film formation apparatus includes performing a coating process inside the process container without product target objects present therein to cover an inner surface of the process container with a coating film, and then performing a film formation process inside the process container accommodating the holder with the product target objects placed thereon to form a predetermined film on the product target objects. The coating process alternately supplies the first and second process gases into the process container without turning either of the first and second process gases into plasma. The film formation process alternately supplies the first and second process gases into the process container while turning at least one of the first and second process gases into plasma.
Public/Granted literature
- US20110129618A1 VERTICAL FILM FORMATION APPARATUS AND METHOD FOR USING SAME Public/Granted day:2011-06-02
Information query
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