发明授权
US08563446B2 Technique to create a buried plate in embedded dynamic random access memory device 有权
在嵌入式动态随机存取存储器件中创建掩埋板的技术

Technique to create a buried plate in embedded dynamic random access memory device
摘要:
A method for forming a trench structure is provided for a semiconductor and/or memory device, such as an DRAM device. In one embodiment, the method for forming a trench structure includes forming a trench in a semiconductor substrate, and exposing the sidewalls of the trench to an arsenic-containing gas to adsorb an arsenic containing layer on the sidewalls of the trench. A material layer is then deposited on the sidewalls of the trench to encapsulate the arsenic-containing layer between the material layer and sidewalls of the trench.
信息查询
0/0