发明授权
- 专利标题: Method of forming a fine pattern, display substrate, and method of manufacturing the same using the method of forming a fine pattern
- 专利标题(中): 使用形成精细图案的方法形成精细图案的方法,显示基板及其制造方法
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申请号: US13349487申请日: 2012-01-12
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公开(公告)号: US08575031B2公开(公告)日: 2013-11-05
- 发明人: Se-Hwan Yu , Chong-Sup Chang , Sang-Ho Park , Ji-Seon Lee
- 申请人: Se-Hwan Yu , Chong-Sup Chang , Sang-Ho Park , Ji-Seon Lee
- 申请人地址: KR
- 专利权人: Samsung Display Co., Ltd.
- 当前专利权人: Samsung Display Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Innovation Counsel LLP
- 优先权: KR10-2011-0030533 20110404
- 主分类号: H01L29/04
- IPC分类号: H01L29/04
摘要:
A method is provided for forming a fine pattern. In the method, a first fine pattern and a first metal pattern are formed by respectively patterning a first fine pattern layer on a base substrate and a first metal layer on the first fine pattern layer. A second fine pattern layer and a second metal layer are sequentially formed over the first fine pattern and the first metal pattern. The second metal layer is patterned, so that a second metal pattern between adjacent portions of the first fine pattern. The second fine pattern layer is patterned using the second metal pattern as a mask, so that a second fine pattern is formed between adjacent portions of the first fine pattern.