摘要:
A wire is provided on an insulating substrate to have a first thickness in a first area and a second thickness smaller than the first thickness in a second area except for the first area. A display apparatus includes the wire. The wire is formed by forming a first conductive layer and a second conductive layer on the insulating substrate and etching the first and second conductive layers using photoresist layer patterns having different thicknesses.
摘要:
Provided is a thin film transistor and thin film transistor panel array. The thin film transistor includes: a substrate; a gate electrode disposed on the substrate; a semiconductor layer disposed on the substrate and partially overlapping with the gate electrode; a source electrode and a drain electrode spaced apart from each other with respect to a channel region of the semiconductor layer; an insulating layer disposed between the gate electrode and the semiconductor layer; and a barrier layer disposed between the semiconductor layer and the source electrode and between the semiconductor layer and the drain electrode, in which the barrier layer comprises graphene. An ohmic contact is provided based on the type of material used for the semiconductor layer.
摘要:
A thin film transistor array panel according to an exemplary embodiment of the present disclosure includes: an insulating substrate; a gate electrode disposed on the insulating substrate; a gate insulating layer disposed on the gate electrode; a semiconductor disposed on the gate insulating layer; a source electrode and a drain electrode disposed on the semiconductor; an ohmic contact layer disposed at an interface between at least one of the source and drain electrodes and the semiconductor. Surface heights of the source and drain electrodes different, while surface heights of the semiconductor and the ohmic contact layer are the same. The ohmic contact layer is made of a silicide of a metal used for the source and drain electrodes.
摘要:
Provided is a thin film transistor and thin film transistor panel array. The thin film transistor includes: a substrate; a gate electrode disposed on the substrate; a semiconductor layer disposed on the substrate and partially overlapping with the gate electrode; a source electrode and a drain electrode spaced apart from each other with respect to a channel region of the semiconductor layer; an insulating layer disposed between the gate electrode and the semiconductor layer; and a barrier layer disposed between the semiconductor layer and the source electrode and between the semiconductor layer and the drain electrode, in which the barrier layer comprises graphene. An ohmic contact is provided based on the type of material used for the semiconductor layer.
摘要:
A method is provided for forming a fine pattern. In the method, a first fine pattern and a first metal pattern are formed by respectively patterning a first fine pattern layer on a base substrate and a first metal layer on the first fine pattern layer. A second fine pattern layer and a second metal layer are sequentially formed over the first fine pattern and the first metal pattern. The second metal layer is patterned, so that a second metal pattern between adjacent portions of the first fine pattern. The second fine pattern layer is patterned using the second metal pattern as a mask, so that a second fine pattern is formed between adjacent portions of the first fine pattern.
摘要:
A display apparatus includes a thin film transistor substrate, a substrate facing the thin film transistor substrate, and a liquid crystal layer. The thin film transistor substrate includes an insulating substrate, a gate electrode disposed on a surface of the insulating substrate, a gate insulating layer covering the gate electrode, a semiconductor layer disposed on the gate insulating layer, a source electrode disposed on the semiconductor layer, and a drain electrode disposed on the semiconductor layer and spaced apart from the source electrode. One of the source electrode and the drain electrode is spaced apart from the gate electrode in a plan view. The gate electrode includes a side surface inclined with respect to the surface of the insulating substrate and is partially overlapped with a portion of the source electrode or the drain electrode in a direction perpendicular to the side surface of the gate electrode.
摘要:
Provided is a thin film transistor array panel. A thin film transistor array panel according to an exemplary embodiment includes a gate wire having a first region where the gate line is disposed, and a second region where the gate electrode is disposed, and a thickness of the gate wire formed in the first region is greater than the thickness of the gate wire that is formed in the second region.
摘要:
A wire is provided on an insulating substrate to have a first thickness in a first area and a second thickness smaller than the first thickness in a second area except for the first area. A display apparatus includes the wire. The wire is formed by forming a first conductive layer and a second conductive layer on the insulating substrate and etching the first and second conductive layers using photoresist layer patterns having different thicknesses.
摘要:
A liquid crystal display is provided. The liquid crystal display includes a substrate. A thin film transistor is disposed on the substrate. A passivation layer is disposed on the thin film transistor. A pixel electrode is disposed on the passivation layer. A minute space layer is disposed on the pixel electrode and includes a liquid crystal injection hole. A first overcoat is disposed on the minute space layer. A common electrode is disposed on the first overcoat. A capping layer covers the liquid crystal injection hole. The capping layer includes graphene.
摘要:
A thin-film transistor (“TFT”) substrate includes a metal wiring including copper or a copper alloy on a substrate, an inorganic layer on an upper surface and side surfaces of the metal wiring to surround the metal wiring, the inorganic layer in direct contact with the metal wiring, and a planarization layer on the inorganic layer and in direct contact with the inorganic layer.