- 专利标题: Method of depositing materials on a non-planar surface
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申请号: US12482263申请日: 2009-06-10
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公开(公告)号: US08580037B2公开(公告)日: 2013-11-12
- 发明人: Ratson Morad
- 申请人: Ratson Morad
- 申请人地址: US CA Fremont
- 专利权人: Solyndra LLC
- 当前专利权人: Solyndra LLC
- 当前专利权人地址: US CA Fremont
- 代理机构: Morgan, Lewis & Bockius, LLP
- 代理商 Brett A. Lovejoy; Ada O. Wong
- 主分类号: C23C16/50
- IPC分类号: C23C16/50 ; C23C16/00 ; C23F1/00 ; H01L21/306
摘要:
A method of depositing materials on a non-planar surface is disclosed. The method is effectuated by rotating non-planar substrates as they travel down a translational path of a processing chamber. As the non-planar substrates simultaneously rotate and translate down a processing chamber, the rotation exposes the whole or any desired portion of the surface area of the non-planar substrates to the deposition process, allowing for uniform deposition as desired. Alternatively, any predetermined pattern is able to be exposed on the surface of the non-planar substrates. Such a method effectuates manufacture of non-planar semiconductor devices, including, but not limited to, non-planar light emitting diodes, non-planar photovoltaic cells, and the like.
公开/授权文献
- US20090255471A1 METHOD OF DEPOSITING MATERIALS ON A NON-PLANAR SURFACE 公开/授权日:2009-10-15
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