Invention Grant
- Patent Title: Method for forming anti-reflection coating and optical element
- Patent Title (中): 防反射涂层和光学元件的形成方法
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Application No.: US12407890Application Date: 2009-03-20
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Publication No.: US08586144B2Publication Date: 2013-11-19
- Inventor: Mineta Suzuki , Takanobu Shiokawa , Kazuhiro Yamada , Hiroyuki Nakayama , Hideki Yamaguchi , Ayako Maruta
- Applicant: Mineta Suzuki , Takanobu Shiokawa , Kazuhiro Yamada , Hiroyuki Nakayama , Hideki Yamaguchi , Ayako Maruta
- Applicant Address: JP Tokyo
- Assignee: Pentax Ricoh Imaging Company, Ltd.
- Current Assignee: Pentax Ricoh Imaging Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JP2008-078477 20080325
- Main IPC: B05D3/10
- IPC: B05D3/10

Abstract:
A method for forming an anti-reflection coating of alkali-treated silica aerogel on a substrate, comprising the steps of hydrolyzing and polymerizing alkoxysilane in the presence of a base catalyst to prepare an alkaline sol, adding an acid catalyst to the alkaline sol to carry out further hydrolysis and polymerization to prepare a first acidic sol, hydrolyzing and polymerizing alkoxysilane in the presence of an acid catalyst to prepare a second acidic sol, mixing the first and second acidic sols, applying the resultant mixed sol to the substrate, drying it, and treating the resultant silica aerogel coating with an alkali.
Public/Granted literature
- US20090244709A1 METHOD FOR FORMING ANTI-REFLECTION COATING AND OPTICAL ELEMENT Public/Granted day:2009-10-01
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