公开(公告)号：US08768644B2

公开(公告)日：2014-07-01

申请号：US13175219

申请日：2011-07-01

申请人： Kunio Miyauchi ,  Hiroyuki Nakayama

发明人： Kunio Miyauchi ,  Hiroyuki Nakayama

IPC分类号： G01N31/00

CPC分类号： G01N15/0625 ,  G01N15/0227 ,  G06K9/6212 ,  G06K9/6218 ,  H01L22/20

摘要： There is provided a support method for a particle distribution analysis for a substrate. In the support method, histogram data of inter-particle distances are created for all particles on a target substrate subjected to the particle distribution analysis from particle coordinate data of the target substrate. Further, histogram data of inter-particle distances are created for multiple virtual substrates each having the same number of randomly distributed particles as the particles on the target substrate. Based on a difference between the histogram data of the target substrate and the histogram data of each of the virtual substrates, determination data are created by quantifying a distance between the histogram data of the target substrate and the histogram data of the multiple virtual substrates, and the determination data are displayed on a display unit.

摘要翻译： 提供了用于衬底的粒子分布分析的支持方法。 在支持方法中，通过目标基板的粒子坐标数据，对经过粒子分布分析的目标基板上的所有粒子产生粒子间距离的直方图数据。 此外，针对每个具有与目标衬底上的粒子相同数量的随机分布的粒子的多个虚拟衬底创建颗粒间距离的直方图数据。 基于目标基板的直方图数据和每个虚拟基板的直方图数据之间的差异，通过量化目标基板的直方图数据与多个虚拟基板的直方图数据之间的距离来创建确定数据，以及 确定数据显示在显示单元上。

公开(公告)号：US08409328B2

公开(公告)日：2013-04-02

申请号：US12726598

申请日：2010-03-18

申请人： Jun Yamawaku ,  Junji Oikawa ,  Hiroyuki Nakayama

发明人： Jun Yamawaku ,  Junji Oikawa ,  Hiroyuki Nakayama

IPC分类号： B03C3/016

CPC分类号： H01L21/67781 ,  H01L21/67017

摘要： A substrate transfer device includes an atmosphere introduction unit and an atmosphere exhaust unit provided at a top and a bottom portion of a main body of the device, respectively; and a substrate transfer mechanism provided between the atmosphere introduction unit and the atmosphere exhaust unit. The substrate transfer device further includes a downward flow forming unit provided, adjacent to the atmosphere introduction unit, to allow an atmosphere to be introduced through the atmosphere introduction unit and to downwardly flow through the substrate transfer mechanism and be exhausted through the atmosphere exhaust unit; and a gas ionizing unit for ionizing the atmosphere and a particle collecting unit for collecting particles included in the atmosphere, the gas ionizing unit and the particle collecting unit being sequentially provided in the direction in which the atmosphere downwardly flows, between the downward flow forming unit and the substrate transfer mechanism.

摘要翻译： 基板转印装置包括分别设置在装置的主体的顶部和底部的气氛引入单元和气体排出单元; 以及设置在大气引入单元和大气排气单元之间的基板输送机构。 基板转印装置还包括与大气引入单元相邻设置的向下流动形成单元，以允许气氛通过大气引入单元引入并向下流过基板传送机构并通过大气排气单元排出; 和用于使气氛离子化的气体离子化单元和用于收集包含在大气中的颗粒的颗粒收集单元，气体离子化单元和颗粒收集单元沿着大气向下流动的方向依次设置在下流形成单元 和基板转印机构。

公开(公告)号：US08398745B2

公开(公告)日：2013-03-19

申请号：US12726612

申请日：2010-03-18

申请人： Jun Yamawaku ,  Junji Oikawa ,  Hiroyuki Nakayama

发明人： Jun Yamawaku ,  Junji Oikawa ,  Hiroyuki Nakayama

IPC分类号： B03C3/019 ,  B03C3/36

CPC分类号： H01L21/67017

摘要： A substrate processing apparatus includes a processing chamber for accommodating therein a processing target substrate; a gas exhaust path through which a gas inside the processing chamber is exhausted; one or more exhaust pumps provided in the gas exhaust path; and a scrubber for collecting harmful components from an exhaust gas. The apparatus further includes an ionized gas supply unit for supplying to the gas exhaust path an ionized gas for neutralizing charged particles included in the exhaust gas flowing therethrough.

摘要翻译： 基板处理装置包括：处理室，用于在其中容纳加工对象基板; 气体排出通道，处理室内的气体通过该排气路径排出; 设置在排气通道中的一个或多个排气泵; 以及用于从废气中收集有害成分的洗涤器。 该装置还包括电离气体供应单元，用于向气体排出通道供应用于中和包含在流过其中的废气中的带电粒子的电离气体。

公开(公告)号：US08337629B2

公开(公告)日：2012-12-25

申请号：US13495404

申请日：2012-06-13

申请人： Tsuyoshi Moriya ,  Hiroshi Nagaike ,  Hiroyuki Nakayama

发明人： Tsuyoshi Moriya ,  Hiroshi Nagaike ,  Hiroyuki Nakayama

IPC分类号： B08B5/00 ,  B08B7/00

CPC分类号： H01L21/67028 ,  B08B3/12 ,  H01J37/32862 ,  H01L21/6831

摘要： To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the particles to scatter by utilizing the Coulomb force, a means for introducing a gas into the vacuum chamber and causing the particles sticking to the element to scatter by causing a gas shock wave to hit the element, a means for heating the element and causing the particles to scatter by utilizing the thermal stress and thermophoretic force, or a means for causing the particles to scatter by applying mechanical vibrations to the element. The thus scattered particles are removed by carrying them in a gas flow in a relatively high pressure atmosphere.

公开(公告)号：US08330454B2

公开(公告)日：2012-12-11

申请号：US12578083

申请日：2009-10-13

申请人： Shigeru Furuki ,  Satoru Sunada ,  Hiroyuki Nakayama ,  Kenji Okamoto

发明人： Shigeru Furuki ,  Satoru Sunada ,  Hiroyuki Nakayama ,  Kenji Okamoto

IPC分类号： G01B7/14

CPC分类号： G01D5/145 ,  F16H59/0204 ,  F16H59/105

摘要： A position detection apparatus includes a position detection target member, a magnet that moves in accordance with movement of the position detection target member, and a plurality of magnetic detectors provided on a surface opposite a movement plane of the magnet. A flat yoke is provided on the reverse face of the magnet. The magnetic polarity of a peripheral side part of the magnet is opposite to the magnetic polarity of a center part thereof. The peripheral side part is formed at a regional range that can be defined on the basis of a predetermined distance(s) measured from a side edge of the yoke.

摘要翻译： 位置检测装置包括位置检测对象部件，根据位置检测对象部件的移动而移动的磁体以及设置在与磁体的移动面相反的面的多个磁检测器。 在磁铁的背面设置有扁平磁轭。 磁体的周边侧部分的磁极性与其中心部分的磁极性相反。 周边部分形成在可以基于从轭的侧边缘测量的预定距离来限定的区域范围。

公开(公告)号：US20120285623A1

公开(公告)日：2012-11-15

申请号：US13559373

申请日：2012-07-26

申请人： Tsuyoshi MORIYA ,  Hiroyuki Nakayama

发明人： Tsuyoshi MORIYA ,  Hiroyuki Nakayama

IPC分类号： H01L21/3065 ,  B05C11/00

CPC分类号： H01J37/32431 ,  H01J2237/022

摘要： There is provided a plasma processing apparatus including a plasma generating unit for generating a plasma in a processing chamber in which a set processing is performed on a substrate serving as an object to be processed. The plasma processing apparatus further includes a particle moving unit for electrostatically driving particles in a region above the substrate to be removed out of the region above the substrate in the processing chamber while the processing on the substrate is performed by using the plasma. In addition, there is provided a plasma processing method of a plasma processing apparatus including the steps of generating plasma in a processing chamber in which a set processing is performed on a substrate serving as an object to be processed; and performing the processing on the substrate by the plasma.

摘要翻译： 提供了一种等离子体处理装置，其包括等离子体产生单元，用于在处理室中产生等离子体，其中对作为待处理对象的基板进行设定处理。 等离子体处理装置还包括一个粒子移动单元，用于在通过使用等离子体进行基板上的处理的同时，在处理室中的基板上方的区域中，将基板上方的区域中的颗粒静电驱动。 此外，提供了一种等离子体处理装置的等离子体处理方法，其包括以下步骤：在对作为被处理对象的基板进行设定处理的处理室中产生等离子体; 并通过等离子体对衬底进行处理。

公开(公告)号：US08303834B2

公开(公告)日：2012-11-06

申请号：US12411953

申请日：2009-03-26

申请人： Masanobu Honda ,  Kenji Masuzawa ,  Hiroyuki Nakayama ,  Manabu Iwata ,  Manabu Sato ,  Kazuki Narishige

发明人： Masanobu Honda ,  Kenji Masuzawa ,  Hiroyuki Nakayama ,  Manabu Iwata ,  Manabu Sato ,  Kazuki Narishige

IPC分类号： B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00

CPC分类号： H01J37/32027 ,  H01J37/32091

摘要： A plasma processing apparatus includes an inner upper electrode provided to face a lower electrode mounting thereon a substrate, an outer upper electrode provided in a ring shape at a radially outside of the inner upper electrode and electrically isolated from the inner upper electrode in a vacuum evacuable processing chamber and a processing gas supply unit for supplying a processing gas into a processing space between the inner and the outer upper electrode and the lower electrode. A radio frequency (RF) power supply unit is also provide to apply a RF power to the lower electrode or the inner and the outer upper electrode to generate a plasma of the processing gas by RF discharge. A first and a second DC power supply unit are provided to apply a first and a second variable DC voltage to the inner upper electrode, respectively.

摘要翻译： 一种等离子体处理装置，包括：内部上部电极，其设置在其上安装有基板的下部电极;外部上部电极，其在所述内部上部电极的径向外侧设置成环状，并且在真空抽真空中与所述内部上部电极电隔离 处理室和处理气体供应单元，用于将处理气体供应到内外电极和下电极之间的处理空间中。 射频（RF）电源单元还提供向下电极或内外电极施加RF功率以通过RF放电产生处理气体的等离子体。 提供第一和第二直流电源单元，以分别向内部上部电极施加第一和第二可变直流电压。

公开(公告)号：US08298622B2

公开(公告)日：2012-10-30

申请号：US11407907

申请日：2006-04-21

申请人： Hiroyuki Nakayama ,  Kazuhiro Yamada ,  Yasuhiro Sakai ,  Maki Yamada

发明人： Hiroyuki Nakayama ,  Kazuhiro Yamada ,  Yasuhiro Sakai ,  Maki Yamada

IPC分类号： C08F2/48

CPC分类号： B01J19/123 ,  C01B33/1585

摘要： Methods for producing a silica aerogel coating by: producing a wet gel formed by the hydrolysis and polymerization of an alkoxysilane having an ultraviolet-polymerizable unsaturated group; organically modifying the wet gel with an organic-modifying agent to obtain an organically modified silica having a modification ratio of 10-30% based on a total amount of Si—OH in the wet gel; coating a dispersion of the organically modified silica on a substrate to form a layer; and subjecting the layer of the organically modified silica to ultraviolet irradiation and baking, wherein the silica aerogel coating includes the organically modified silica and wherein the silica aerogel coating has a refractive index in the range of 1.05-1.2.

摘要翻译： 二氧化硅气凝胶涂层的制造方法：制造通过具有紫外线聚合性不饱和基团的烷氧基硅烷的水解和聚合而形成的湿凝胶; 用有机改性剂有机改性湿凝胶，得到基于湿凝胶中Si-OH总量的改性比为10-30％的有机改性二氧化硅; 将有机改性二氧化硅的分散体涂布在基材上以形成层; 并对有机改性二氧化硅层进行紫外线照射和烘烤，其中二氧化硅气凝胶涂层包括有机改性二氧化硅，其中二氧化硅气凝胶涂层的折射率在1.05-1.2范围内。

公开(公告)号：US08221237B2

公开(公告)日：2012-07-17

申请号：US12282835

申请日：2007-03-12

申请人： Hiroyuki Nakayama

发明人： Hiroyuki Nakayama

IPC分类号： G06F19/00 ,  G10G1/04

CPC分类号： A63F13/54 ,  A63F13/10 ,  A63F2300/6063 ,  A63F2300/6081 ,  A63F2300/64

摘要： A first sound volume calculation unit (251) obtains a length of a straight line connecting a sound emitting object and a sound detection object, and calculates a first sound volume attenuated from a predetermined reference sound volume in accordance with the length. A second volume calculation unit (252), in a case where on the straight line there is an other object that is an obstacle, calculates a second sound volume attenuated from the first sound volume by a predetermined ratio. A third volume calculation unit (253) draws from each of the sound emitting object and the sound detection object a plurality of space recognition lines that spread in plane and at a predetermined angle from the straight line locating as a center, and calculates a third sound volume attenuated from either one of the first sound volume and the second sound volume in accordance with an attenuation ratio determined by the number of the space recognition lines having a same angle and intersecting with each other without being intercepted by the other object that is an obstacle. An output sound control unit (207) outputs game sound based on the calculated third sound volume.

摘要翻译： 第一音量计算单元（251）获得连接发声对象和声音检测对象的直线的长度，并且根据长度计算从预定参考音量衰减的第一音量。 第二音量计算单元（252）在直线上存在作为障碍物的其他物体的情况下，以预定比率计算从第一音量衰减的第二音量。 第三音量计算单元（253）从每个声音发射对象和声音检测对象抽取多个空间识别行，其以从定位为中心的直线以平面和预定角度扩展，并且计算第三声音 根据由具有相同角度的空间识别线的数量确定的衰减比，由第一音量和第二音量中的任何一个音量衰减的音量彼此相交而不被作为障碍物的另一个物体截取 。 输出声音控制单元（207）基于计算出的第三音量输出游戏声音。

公开(公告)号：US08117986B2

公开(公告)日：2012-02-21

申请号：US11581000

申请日：2006-10-16

申请人： Hidehito Saigusa ,  Taira Takase ,  Kouji Mitsuhashi ,  Hiroyuki Nakayama

发明人： Hidehito Saigusa ,  Taira Takase ,  Kouji Mitsuhashi ,  Hiroyuki Nakayama

IPC分类号： C23C16/00

CPC分类号： H01J37/32477 ,  Y10S156/916

摘要： The present invention presents an improved deposition shield for surrounding a process space in a plasma processing system, wherein the design and fabrication of the deposition shield advantageously provides for a clean processing plasma in the process space with substantially minimal erosion of the deposition shield.

摘要翻译： 本发明提出了一种用于围绕等离子体处理系统中的处理空间的改进的沉积屏蔽，其中沉积屏蔽的设计和制造有利地在处理空间中提供清洁的处理等离子体，同时具有基本上最小的沉积屏蔽侵蚀。