Invention Grant
US08587767B2 Illumination optics for EUV microlithography and related system and apparatus
有权
用于EUV微光刻的照明光学器件及相关系统和装置
- Patent Title: Illumination optics for EUV microlithography and related system and apparatus
- Patent Title (中): 用于EUV微光刻的照明光学器件及相关系统和装置
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Application No.: US12915785Application Date: 2010-10-29
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Publication No.: US08587767B2Publication Date: 2013-11-19
- Inventor: Damian Fiolka , Berndt Warm , Christian Steigerwald , Martin Endres , Ralf Stuetzle , Jens Ossmann , Ralf Scharnweber , Markus Hauf , Udo Dinger , Severin Waldis , Marc Kirch , Joachim Hartjes
- Applicant: Damian Fiolka , Berndt Warm , Christian Steigerwald , Martin Endres , Ralf Stuetzle , Jens Ossmann , Ralf Scharnweber , Markus Hauf , Udo Dinger , Severin Waldis , Marc Kirch , Joachim Hartjes
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102008001511 20080430
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/54 ; G03B27/68 ; G03B27/42 ; G03B27/32
Abstract:
Illumination optics for EUV microlithography guide an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1.
Public/Granted literature
- US20110063598A1 ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND RELATED SYSTEM AND APPARATUS Public/Granted day:2011-03-17
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