公开(公告)号：US09310692B2

公开(公告)日：2016-04-12

申请号：US12916882

申请日：2010-11-01

Applicant: Ralf Stuetzle ,  Martin Endres ,  Jens Ossmann ,  Michael Layh

Inventor： Ralf Stuetzle ,  Martin Endres ,  Jens Ossmann ,  Michael Layh

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70066 ,  G03F7/70083 ,  G03F7/70558

Abstract: A component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus is disclosed. The component includes a plurality of diaphragms which are arranged alongside one another with respect to a direction perpendicular to the scan movement and which differ in their form and the position of which can be altered approximately in the scan direction so that a portion of the illumination energy can be vignetted by at least one diaphragm. The form of the individual diaphragm is specifically adapted to the form of the illumination in a diaphragm plane in which the component is arranged. This has the effect that at least parts of the delimiting edges of two diaphragms always differ in the case of an arbitrary displacement of the diaphragms.

Abstract translation: 公开了一种用于在微光刻投影曝光装置的物平面中设置扫描集成照明能量的部件。 该部件包括多个隔膜，它们相对于垂直于扫描移动的方向彼此并排布置，并且其形状不同，其位置可以在扫描方向上大致改变，使得照射能量的一部分 可以由至少一个隔膜取消。 单个隔膜的形式特别适用于其中布置有该部件的隔膜平面中的照明形式。 这具有以下效果：在隔膜的任意位移的情况下，两个隔膜的至少一部分限界边缘总是不同。

公开(公告)号：US09235137B2

公开(公告)日：2016-01-12

申请号：US13370829

申请日：2012-02-10

Applicant: Damian Fiolka ,  Ralf Stuetzle

Inventor： Damian Fiolka ,  Ralf Stuetzle

IPC: G03B27/72 ,  G03F7/20 ,  G02B27/09 ,  G21K1/06 ,  G21K1/16

CPC classification number: G03F7/70233 ,  G02B27/0905 ,  G02B27/0977 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70566 ,  G21K1/06 ,  G21K1/16 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/067

Abstract: An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination optical unit. There are at least two first facet elements to which radiation having a differing polarization is applied. The first faceted optical element has at least one first state in which the normal vectors of the reflective surfaces of the first facet elements are selected so that a first predetermined polarization distribution results at the location of the object field during the operation of the illumination optical unit.

Abstract translation: 照明光学单元包括集光镜，其在照明光学单元的操作期间产生施加到第一刻面光学元件的偏振分布。 存在施加具有不同极化的辐射的至少两个第一小面元件。 第一刻面光学元件具有至少一个第一状态，其中第一面元件的反射表面的法向矢量被选择为使得在照明光学单元的操作期间在物场的位置处产生第一预定偏振分布 。

公开(公告)号：US20110235015A1

公开(公告)日：2011-09-29

申请号：US13076730

申请日：2011-03-31

Applicant: Guenther Dengel ,  Gero Wittich ,  Udo Dinger ,  Ralf Stuetzle ,  Martin Endres ,  Jens Ossmann ,  Berndt Warm

Inventor： Guenther Dengel ,  Gero Wittich ,  Udo Dinger ,  Ralf Stuetzle ,  Martin Endres ,  Jens Ossmann ,  Berndt Warm

IPC: G03B27/72

CPC classification number: G03F7/7085 ,  G03F7/70141 ,  G03F7/702 ,  G03F7/70558

Abstract: An illumination optics for EUV microlithography illuminates an object field with the aid of an EUV used radiation beam. Preset devices preset illumination parameters. An illumination correction device corrects the intensity distribution and/or the angular distribution of the object field illumination. The latter has an optical component to which the used radiation beam is at least partially applied upstream of the object field and which can be driven in a controlled manner. A detector acquires one of the illumination parameters. An evaluation device evaluates the detector data and converts the latter into control signals. At least one actuator displaces the optical component. During exposures, the actuators are controlled with the aid of the detector signals during the period of a projection exposure. A maximum displacement of below 8 μm is ensured for edges of the object field towards an object to be exposed. The result is an illumination optics that is used to ensure conformance with preset illumination parameters even given the most stringent demands upon precision.

Abstract translation: 用于EUV微光刻的照明光学器件借助EUV使用的辐射束照亮物体场。 预设设备预设照明参数。 照明校正装置校正物场照明的强度分布和/或角分布。 后者具有光学部件，使用的辐射束至少部分地施加在物场的上游，并且可以以受控的方式驱动。 检测器获取照明参数之一。 评估装置评估检测器数据并将其转换成控制信号。 至少一个致动器移动光学部件。 在曝光期间，在投影曝光期间借助于检测器信号来控制致动器。 确保物体边缘朝向待曝光物体的8μm以下的最大位移。 结果是一个照明光学器件，用于确保符合预设的照明参数，即使在最严格的精度要求下。

公开(公告)号：US08179519B2

公开(公告)日：2012-05-15

申请号：US12046836

申请日：2008-03-12

Applicant: Ralf Stuetzle

Inventor： Ralf Stuetzle

IPC: G03B27/68

CPC classification number: G03F7/7085 ,  G03F7/70141

Abstract: An adjusting device used to align two components of a microlithography projection exposure installation relative to each other. The adjusting device has an autocollimating device with a light source and a reflector. The light source and the reflector are each rigidly connected to one of the optical components. In one embodiment, the adjusting device has a laser light source which is different from the radiation source. A beam-splitter is downstream from the laser light source and carries useful adjustment light along a first optical path. A reflector can be rigidly connected to a reference component of an illuminating optics system or to a radiation source so that when an actual position of the reference component relative to the radiation source coincides with a desired position, the useful adjustment light is reflected back on itself. A bundle-sensitive component is sensitive to the direction and position of useful adjustment light in the optical path between bundle-sensitive component and reflector. The bundle-sensitive component can be rigidly mounted relative to the radiation source or the reflector. A light sensor is downstream from the beam-splitter in a second optical path for the useful adjustment light which is reflected back by the reflector. This results in an adjusting device which makes it possible to achieve high adjustment accuracy with relatively low construction expense.

Abstract translation: 调整装置，用于对准微光刻投影曝光装置的两个部件相对于彼此。 调节装置具有自动准直装置，其具有光源和反射器。 光源和反射器各自刚性地连接到一个光学部件。 在一个实施例中，调节装置具有与辐射源不同的激光光源。 分束器在激光光源的下游，并沿着第一光路传送有用的调节光。 反射器可以刚性地连接到照明光学系统的参考部件或辐射源，使得当参考部件相对于辐射源的实际位置与期望的位置一致时，有用的调节光被自身反射回 。 束敏感组件对束敏感组件和反射器之间的光路中的有用调节光的方向和位置敏感。 束敏感组件可以相对于辐射源或反射器刚性地安装。 光传感器在用于由反射器反射回的有用调节光的第二光路中的分束器的下游。 这导致调节装置，其可以以相对低的构造费用实现高调整精度。

公开(公告)号：US07910900B2

公开(公告)日：2011-03-22

申请号：US11781010

申请日：2007-07-20

Applicant: Ralf Stuetzle ,  Udo Dinger

Inventor： Ralf Stuetzle ,  Udo Dinger

IPC: A61N5/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B2207/123 ,  G03F7/70166

Abstract: Collectors with mirror shells arranged inside each other, illumination systems equipped with such collectors, projection exposure apparatuses equipped with such illumination systems, methods of manufacturing microelectronic components with such projection exposure apparatuses, and related systems, components and methods are disclosed.

Abstract translation: 公开了具有彼此布置的具有镜壳的收集器，配备有这种收集器的照明系统，配备有这种照明系统的投影曝光装置，具有这种投影曝光装置的微电子部件的制造方法以及相关系统，部件和方法。

公开(公告)号：US20110063598A1

公开(公告)日：2011-03-17

申请号：US12915785

申请日：2010-10-29

Applicant: Damian Fiolka ,  Berndt Warm ,  Christian Steigerwald ,  Martin Endres ,  Ralf Stuetzle ,  Jens Ossmann ,  Ralf Scharnweber ,  Markus Hauf ,  Udo Dinger ,  Severin Waldis ,  Marc Kirch ,  Joachim Hartjes

Inventor： Damian Fiolka ,  Berndt Warm ,  Christian Steigerwald ,  Martin Endres ,  Ralf Stuetzle ,  Jens Ossmann ,  Ralf Scharnweber ,  Markus Hauf ,  Udo Dinger ,  Severin Waldis ,  Marc Kirch ,  Joachim Hartjes

IPC: G03B27/72

CPC classification number: G03F7/70191 ,  G03F7/70083

Abstract: An illumination optics for EUV microlithography guides an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1. A field facet mirror has a plurality of field facets that set defined illumination conditions in the object field. A following optics downstream of the field facet mirror transmits the illumination light into the object field. The following optics includes a pupil facet mirror with a plurality of pupil facets. The field facets are in each case individually allocated to the pupil facets so that portions of the illumination light bundle impinging upon in each case one of the field facets are guided on to the object field via the associated pupil facet. The field facet mirror not only includes a plurality of basic illumination field facets which provide a basic illumination of the object field via associated basic illumination pupil facets, but also includes a plurality of correction illumination field facets which provide for a correction of the illumination of the object field via associated correction illumination pupil facets. The result is an illumination optics which allows unwanted variations of illumination parameters, for instance an illumination intensity distribution or an illumination angle distribution, to be corrected across the object field.

Abstract translation: 用于EUV微光刻的照明光学器件将照射光束从辐射源引导到物场，其具有在较大场尺寸和较短场尺寸之间的延伸比，其中该比率远大于1.场分面镜具有多个 的场面在场景中设置定义的照明条件。 在场面反射镜下游的以下光学器件将照明光透射到物体场中。 以下光学器件包括具有多个光瞳面的光瞳小面镜。 场分面在每种情况下分别被分配给光瞳面，使得在各种情况下照射的照明光束的一部分通过相关联的光瞳小面被引导到物场。 场面镜不仅包括多个基本照明场面，它们通过相关联的基本照明光瞳面提供物场的基本照明，而且还包括多个校正照明场面，其提供对照射的照明的校正 通过相关联的校正照明光瞳面进行物体场。 结果是照明光学元件允许在整个对象场校正照明参数的不期望的变化，例如照明强度分布或照明角度分布。

公开(公告)号：US20080259303A1

公开(公告)日：2008-10-23

申请号：US12103185

申请日：2008-04-15

Applicant: Jens Ossmann ,  Martin Endres ,  Ralf Stuetzle

Inventor： Jens Ossmann ,  Martin Endres ,  Ralf Stuetzle

IPC: G03B27/70 ,  G03B27/54

CPC classification number: G03F7/70841 ,  G03F7/702 ,  G03F7/70808 ,  G03F7/70833

Abstract: A projection exposure apparatus for microlithography is disclosed. The apparatus can include a radiation source to generate illumination radiation and a reticle holder to receive a reticle in an object plane. The apparatus can further include illumination optics to guide the illumination radiation to an object field, which is to be illuminated, in the object plane. The apparatus can also include a wafer holder to receive a wafer in an image plane and projection optics to image the object field into an image field in the image plane. The radiation source and projection optics can be arranged in separate chambers (e.g., one above the other). The chambers can be separated by a wall. There can be an illumination radiation leadthrough in the wall. In some embodiments, the projection exposure apparatus can guide the illumination radiation with low loss.

Abstract translation: 公开了一种用于微光刻的投影曝光装置。 该装置可以包括用于产生照明辐射的辐射源和用于在物平面中接收光罩的光罩保持器。 该装置还可以包括照明光学器件，以将照射辐射引导到物体平面中要被照明的物体场。 该装置还可以包括用于在图像平面中接收晶片的晶片保持器和用于将对象场成像到图像平面中的图像场的投影光学器件。 辐射源和投影光学器件可以布置在分开的腔室中（例如，彼此之一）。 这些室可以被墙隔开。 墙壁上可以有一个照明辐射引线。 在一些实施例中，投影曝光装置可以低损耗地引导照射辐射。

公开(公告)号：US08587767B2

公开(公告)日：2013-11-19

申请号：US12915785

申请日：2010-10-29

Applicant: Damian Fiolka ,  Berndt Warm ,  Christian Steigerwald ,  Martin Endres ,  Ralf Stuetzle ,  Jens Ossmann ,  Ralf Scharnweber ,  Markus Hauf ,  Udo Dinger ,  Severin Waldis ,  Marc Kirch ,  Joachim Hartjes

Inventor： Damian Fiolka ,  Berndt Warm ,  Christian Steigerwald ,  Martin Endres ,  Ralf Stuetzle ,  Jens Ossmann ,  Ralf Scharnweber ,  Markus Hauf ,  Udo Dinger ,  Severin Waldis ,  Marc Kirch ,  Joachim Hartjes

IPC: G03B27/72 ,  G03B27/54 ,  G03B27/68 ,  G03B27/42 ,  G03B27/32

CPC classification number: G03F7/70191 ,  G03F7/70083

Abstract: Illumination optics for EUV microlithography guide an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1.

Abstract translation: 用于EUV微光刻的照明光学器件将照射光束从辐射源引导到物场，其具有较长场尺寸和较短场尺寸之间的延伸比，其中该比率显着大于1。

公开(公告)号：US08253925B2

公开(公告)日：2012-08-28

申请号：US12533513

申请日：2009-07-31

Applicant: Jens Ossmann ,  Martin Endres ,  Ralf Stuetzle

Inventor： Jens Ossmann ,  Martin Endres ,  Ralf Stuetzle

IPC: G03B27/54

CPC classification number: G03F7/702 ,  G03F7/70075 ,  G03F7/70083

Abstract: In general, in one aspect, the invention features a system that includes an illumination system of a microlithography tool, the illumination system including a first component having a plurality of elements. During operation of the system, the elements direct radiation from a source along an optical path to an arc-shaped object field at an object plane of a projection objective, and at least one of the elements has a curved shape that is different from the arc-shape of the object field.

Abstract translation: 通常，在一个方面，本发明的特征在于包括微光刻工具的照明系统的系统，所述照明系统包括具有多个元件的第一部件。 在系统操作期间，元件将来自光源的源的辐射直接引向投影物镜的物平面处的弧形物场，并且至少一个元件具有与弧不同的弯曲形状 对象字段的形状。

公开(公告)号：US08174677B2

公开(公告)日：2012-05-08

申请号：US12233914

申请日：2008-09-19

Applicant: Jens Ossmann ,  Martin Endres ,  Ralf Stuetzle

Inventor： Jens Ossmann ,  Martin Endres ,  Ralf Stuetzle

IPC: G03B27/54 ,  G03B27/70 ,  G02B5/08

CPC classification number: G03F7/70083 ,  G03F7/70075

Abstract: The disclosure provides an illumination optical system for microlithography that is designed so that, even with a change of illumination setting (e.g., a change in the given illumination conditions in the object field), variation of illumination parameters over the object field is confined within predetermined tolerances.

Abstract translation: 本公开提供了一种用于微光刻的照明光学系统，其被设计成使得即使随着照明设置的改变（例如，对象场中的给定照明条件的改变），在物场上的照明参数的变化被限制在预定的 公差。