发明授权
- 专利标题： Process and materials for making contained layers and devices made with same
- 专利标题（中）： 制作含有相同层数和装置的工艺和材料
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申请号： US12643403申请日： 2009-12-21
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公开(公告)号： US08592239B2公开(公告)日： 2013-11-26
- 发明人: Adam Fennimore , Jonathan M. Ziebarth , Nora Sabina Radu
- 申请人： Adam Fennimore , Jonathan M. Ziebarth , Nora Sabina Radu
- 申请人地址： US DE Wilmington
- 专利权人： E I du Pont de Nemours and Company
- 当前专利权人： E I du Pont de Nemours and Company
- 当前专利权人地址： US DE Wilmington
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from either the exposed areas or the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer. There is also provided an organic electronic device made by the process.