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    Process and materials for making contained layers and devices made with same
    1.
    发明授权
    Process and materials for making contained layers and devices made with same 有权
    制作含有相同层数和装置的工艺和材料

    公开(公告)号：US08592239B2

    公开(公告)日：2013-11-26

    申请号：US12643403

    申请日：2009-12-21

    申请人： Adam Fennimore ,  Jonathan M. Ziebarth ,  Nora Sabina Radu

    发明人： Adam Fennimore ,  Jonathan M. Ziebarth ,  Nora Sabina Radu

    IPC分类号： H01L21/00

    CPC分类号： H01L51/52 ,  B05D3/06 ,  H01L51/0002 ,  H01L51/0004 ,  H01L51/0012 ,  H01L51/56

    摘要： There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from either the exposed areas or the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer. There is also provided an organic electronic device made by the process.

    摘要翻译： 提供了一种用于在第一层上形成包含的第二层的方法，包括以下步骤：形成具有第一表面能的第一层; 用起始层处理第一层; 以辐射模式曝光引发层，导致曝光区域和未曝光区域; 开发底漆层以有效地从曝光区域或未曝光区域去除底漆层，从而产生具有起泡层图案的第一层，其中底漆层的图案具有比第一表面能高的第二表面能 ; 以及通过在第一层上的起动层的图案上的液体沉积形成第二层。 还提供了通过该方法制造的有机电子装置。

    PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME
    2.
    发明申请
    PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME 有权
    用于制造包含层的工艺和材料及其制品

    公开(公告)号：US20110017980A1

    公开(公告)日：2011-01-27

    申请号：US12643403

    申请日：2009-12-21

    申请人： Adam Fennimore ,  Jonathan M. Ziebarth ,  Nora Sabina Radu

    发明人： Adam Fennimore ,  Jonathan M. Ziebarth ,  Nora Sabina Radu

    IPC分类号： H01L51/00 ,  H01L21/04 ,  H01L51/50

    CPC分类号： H01L51/52 ,  B05D3/06 ,  H01L51/0002 ,  H01L51/0004 ,  H01L51/0012 ,  H01L51/56

    摘要： There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from either the exposed areas or the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer. There is also provided an organic electronic device made by the process.

    摘要翻译： 提供了一种用于在第一层上形成包含的第二层的方法，包括以下步骤：形成具有第一表面能的第一层; 用起始层处理第一层; 以辐射模式曝光引发层，导致曝光区域和未曝光区域; 开发底漆层以有效地从曝光区域或未曝光区域去除底漆层，从而产生具有起泡层图案的第一层，其中底漆层的图案具有比第一表面能高的第二表面能 ; 以及通过在第一层上的起动层的图案上的液体沉积形成第二层。 还提供了通过该方法制造的有机电子装置。

    PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME
    5.
    发明申请
    PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME 审中-公开
    用于制造包含层的工艺和材料及其制品

    公开(公告)号：US20130087779A1

    公开(公告)日：2013-04-11

    申请号：US13704003

    申请日：2011-06-16

    申请人： Kyung-Ho Park ,  Nora Sabina Radu ,  Gary A. Johansson ,  William J. Delaney ,  Adam Fennimore ,  Daniel David Lecloux

    发明人： Kyung-Ho Park ,  Nora Sabina Radu ,  Gary A. Johansson ,  William J. Delaney ,  Adam Fennimore ,  Daniel David Lecloux

    IPC分类号： B05D3/06 ,  H01L51/52 ,  H01L51/56

    CPC分类号： B05D3/06 ,  C08G2261/3162 ,  C08G2261/95 ,  G03F7/027 ,  G03F7/405 ,  H01L51/0004 ,  H01L51/0035 ,  H01L51/50 ,  H01L51/5048 ,  H01L51/52 ,  H01L51/56

    摘要： There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer.The priming material has Formula I or Formula I′: In Formula I or Formula I′: Ar1 and Ar2 are the same or different and are aryl groups; R1 through R5 are independently the same or different at each occurrence and are D, F, alkyl, aryl, alkoxy, silyl, or a crosslinkable group; R6 is H, D, or halogen; a through e are independently an integer from 0 to 4; f is 1 or 2; g is 0, 1 or 2; h is 1 or 2; and n is an integer greater than 0.

    摘要翻译： 提供了一种用于在第一层上形成包含的第二层的方法，包括以下步骤：形成具有第一表面能的第一层; 用起动材料处理第一层以形成起动层; 以辐射模式曝光引发层，导致曝光区域和未曝光区域; 开发底漆层以有效地从未曝光区域去除底漆层，从而产生具有起泡层图案的第一层，其中底漆层的图案具有高于第一表面能的第二表面能; 以及通过在第一层上的起动层的图案上的液体沉积形成第二层。 起始材料具有式I或式I'：在式I或式I'中：Ar 1和Ar 2相同或不同，为芳基; R 1至R 5各自独立地相同或不同，为D，F，烷基，芳基，烷氧基，甲硅烷基或可交联基团; R6是H，D或卤素; a至e独立地为0至4的整数; f为1或2; g为0,1或2; h为1或2; 并且n是大于0的整数。