Invention Grant
- Patent Title: Process and materials for making contained layers and devices made with same
- Patent Title (中): 制作含有相同层数和装置的工艺和材料
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Application No.: US12643403Application Date: 2009-12-21
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Publication No.: US08592239B2Publication Date: 2013-11-26
- Inventor: Adam Fennimore , Jonathan M. Ziebarth , Nora Sabina Radu
- Applicant: Adam Fennimore , Jonathan M. Ziebarth , Nora Sabina Radu
- Applicant Address: US DE Wilmington
- Assignee: E I du Pont de Nemours and Company
- Current Assignee: E I du Pont de Nemours and Company
- Current Assignee Address: US DE Wilmington
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from either the exposed areas or the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer. There is also provided an organic electronic device made by the process.
Public/Granted literature
- US20110017980A1 PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME Public/Granted day:2011-01-27
Information query
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