发明授权
US08592984B2 Semiconductor integrated circuit device and method of manufacturing the same 有权
半导体集成电路器件及其制造方法

Semiconductor integrated circuit device and method of manufacturing the same
摘要:
To suppress peeling of an Au pad for external coupling provided in a rewiring containing Cu as a main component. On the surface of a rewiring including a two-layer film in which a first Ni film is laminated on the top of a Cu film, a pad to which a wire is coupled is formed. The pad includes a two-layer film in which an Au film is laminated on the top of a second Ni film and formed integrally so as to cover the top surface and the side surface of the rewiring. Due to this, the area of contact between the rewiring and the pad increases, and therefore, the pad becomes difficult to be peeled off from the rewiring.
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