Invention Grant
US08598557B2 Method and apparatus for providing patterned illumination fields for machine vision systems
有权
用于为机器视觉系统提供图案化照明场的方法和装置
- Patent Title: Method and apparatus for providing patterned illumination fields for machine vision systems
- Patent Title (中): 用于为机器视觉系统提供图案化照明场的方法和装置
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Application No.: US10519180Application Date: 2003-06-20
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Publication No.: US08598557B2Publication Date: 2013-12-03
- Inventor: Don W. Cochran , Steven D. Cech , Thomas H. Palombo , Michael L. Yoder , Jesse C. Booher , Terry L. Graves
- Applicant: Don W. Cochran , Steven D. Cech , Thomas H. Palombo , Michael L. Yoder , Jesse C. Booher , Terry L. Graves
- Applicant Address: US OH Cleveland
- Assignee: Pressco Technology Inc.
- Current Assignee: Pressco Technology Inc.
- Current Assignee Address: US OH Cleveland
- Agency: Fay Sharpe LLP
- International Application: PCT/US03/19580 WO 20030620
- International Announcement: WO04/001285 WO 20031231
- Main IPC: G01N21/86
- IPC: G01N21/86 ; G01N21/00

Abstract:
This application relates to an apparatus and method for providing patterned illumination fields for use within process control and article inspection applications. More specifically, it pertains to the use of patterned illuminators to enable visual surface inspection of polished objects such as ball bearings. The use of patterned illuminators properly disposed in relation to a polished part under inspection allows small surface imperfections such as scratches and pits to become visible against the normal surface background. The use of carefully engineered illuminators facilitates advantageous defect-site scattering from generally dark field sources. The patterned nature of the illuminators defined by this invention allows the complete surface of three-dimensional parts to be effectively highlighted using dark field illumination fields.
Public/Granted literature
- US20060091333A1 Patterned illumination method and apparatus for machine vision systems Public/Granted day:2006-05-04
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