发明授权
- 专利标题: Method of inspecting semiconductor device
- 专利标题(中): 检测半导体器件的方法
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申请号: US13244434申请日: 2011-09-24
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公开(公告)号: US08605277B2公开(公告)日: 2013-12-10
- 发明人: Satoshi Yamada , Takashi Karashima , Kenya Hironaga , Masatoshi Yasunaga , Yuji Fujimoto
- 申请人: Satoshi Yamada , Takashi Karashima , Kenya Hironaga , Masatoshi Yasunaga , Yuji Fujimoto
- 申请人地址: JP Kawasaki-shi
- 专利权人: Renesas Electronics Corporation
- 当前专利权人: Renesas Electronics Corporation
- 当前专利权人地址: JP Kawasaki-shi
- 代理机构: Miles & Stockbridge P.C.
- 优先权: JP2010-224927 20101004
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
Reliability of a semiconductor device is improved. In a flatness inspection of BGA (semiconductor device), there is formed a flatness standard where a permissible range in the direction of (+) of flatness at normal temperature is smaller than a permissible range in the direction of (−). With use of the above flatness standard, a flatness inspection of the semiconductor device at normal temperature is performed to determine whether the mounted item is non-defective or defective. With the above process, defective mounting caused by a package warp when heated during reflow soldering etc. is reduced and reliability of BGA is improved. At the same time, flatness management of a substrate-type semiconductor device with better consideration of a mounting state can be performed.
公开/授权文献
- US20120081702A1 METHOD OF INSPECTING SEMICONDUCTOR DEVICE 公开/授权日:2012-04-05
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