Invention Grant
- Patent Title: Method of manufacturing an inductor for a microelectronic device
- Patent Title (中): 制造微电子器件的电感器的方法
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Application No.: US13215458Application Date: 2011-08-23
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Publication No.: US08621744B2Publication Date: 2014-01-07
- Inventor: Aleksandar Aleksov , Gloria Alejandra Camacho-Bragado
- Applicant: Aleksandar Aleksov , Gloria Alejandra Camacho-Bragado
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Winkle, PLLC
- Main IPC: H01F7/06
- IPC: H01F7/06

Abstract:
A method of manufacturing an inductor for a microelectronic device comprises providing a substrate (610), forming a first plurality of inductor windings (111, 211, 411, 620, 2030) over the substrate, forming a magnetic inductor core (112, 212, 412, 810) over the first plurality of inductor windings, and forming a second plurality of inductor windings (113, 213, 413, 1010) over the magnetic inductor core. In another embodiment, the method comprises forming the inductor on a sacrificial substrate (1610) such that the inductor can subsequently be mounted onto a carrier tape (1810). In yet another embodiment, a method of manufacturing a substrate for a microelectronic device comprises forming an inductor within a build-up layer (101, 102, 103, 104) of a substrate.
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