发明授权
- 专利标题： Substrate processing apparatus
- 专利标题（中）： 基板加工装置
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申请号： US12725981申请日： 2010-03-17
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公开(公告)号： US08631809B2公开(公告)日： 2014-01-21
- 发明人: Tetsuya Hamada , Takashi Taguchi
- 申请人： Tetsuya Hamada , Takashi Taguchi
- 申请人地址： JP
- 专利权人： Sokudo Co., Ltd.
- 当前专利权人： Sokudo Co., Ltd.
- 当前专利权人地址： JP
- 代理机构： Ostrolenk Faber LLP
- 优先权： JP2009-066808 20090318
- 主分类号： B08B3/00
- IPC分类号： B08B3/00
摘要：
An interface block is constituted by a cleaning/drying processing block and a carry-in/carry-out block. The cleaning/drying processing block includes cleaning/drying processing sections and a transport section. The transport section is provided with a transport mechanism. The carry-in/carry-out block is provided with a transport mechanism. The transport mechanism carries substrates in and out of an exposure device.
公开/授权文献
- US20100236587A1 SUBSTRATE PROCESSING APPARATUS 公开/授权日：2010-09-23
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