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    Substrate processing apparatus
    1.
    发明授权
    Substrate processing apparatus 有权
    基板加工装置

    公开(公告)号：US08631809B2

    公开(公告)日：2014-01-21

    申请号：US12725981

    申请日：2010-03-17

    Applicant: Tetsuya Hamada ,  Takashi Taguchi

    Inventor： Tetsuya Hamada ,  Takashi Taguchi

    IPC: B08B3/00

    CPC classification number: G03F7/20 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67303 ,  H01L21/67742 ,  H01L21/67748 ,  Y10S134/902

    Abstract: An interface block is constituted by a cleaning/drying processing block and a carry-in/carry-out block. The cleaning/drying processing block includes cleaning/drying processing sections and a transport section. The transport section is provided with a transport mechanism. The carry-in/carry-out block is provided with a transport mechanism. The transport mechanism carries substrates in and out of an exposure device.

    Abstract translation: 接口块由清洁/干燥处理块和进/出块组成。 清洁/干燥处理块包括清洁/干燥处理部分和传送部分。 运输部分设有运输机构。 输入/输出块具有传送机构。 输送机构将基板输入和移出曝光装置。

    SUBSTRATE PROCESSING APPARATUS
    2.
    发明申请
    SUBSTRATE PROCESSING APPARATUS 有权
    基板加工设备

    公开(公告)号：US20100236587A1

    公开(公告)日：2010-09-23

    申请号：US12725981

    申请日：2010-03-17

    Applicant: Tetsuya HAMADA ,  Takashi Taguchi

    Inventor： Tetsuya HAMADA ,  Takashi Taguchi

    IPC: B08B7/00

    CPC classification number: G03F7/20 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67303 ,  H01L21/67742 ,  H01L21/67748 ,  Y10S134/902

    Abstract: An interface block is constituted by a cleaning/drying processing block and a carry-in/carry-out block. The cleaning/drying processing block includes cleaning/drying processing sections and a transport section. The transport section is provided with a transport mechanism. The carry-in/carry-out block is provided with a transport mechanism. The transport mechanism carries substrates in and out of an exposure device.

    Abstract translation: 接口块由清洁/干燥处理块和进/出块组成。 清洁/干燥处理块包括清洁/干燥处理部分和传送部分。 运输部分设有运输机构。 输入/输出块具有传送机构。 输送机构将基板输入和移出曝光装置。

    Substrate processing method
    3.
    发明授权
    Substrate processing method 有权
    基板加工方法

    公开(公告)号：US09032977B2

    公开(公告)日：2015-05-19

    申请号：US14106215

    申请日：2013-12-13

    Applicant: Tetsuya Hamada ,  Takashi Taguchi

    Inventor： Tetsuya Hamada ,  Takashi Taguchi

    IPC: G03F7/20 ,  H01L21/67 ,  H01L21/673 ,  H01L21/677

    CPC classification number: G03F7/20 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67303 ,  H01L21/67742 ,  H01L21/67748 ,  Y10S134/902

    Abstract: A method for processing a plurality of substrates after forming a photosensitive film on each substrate includes carrying each substrate into a placement buffer including a plurality of supporters by a first transport mechanism; taking out each substrate from the placement buffer to an interface by a second transport mechanism; carrying each substrate into the exposure device; carrying each substrate out of the exposure device into the placement buffer by the second transport mechanism; taking out each substrate from the placement buffer to the processing section by the first transport mechanism; performing development processing on each substrate; making each substrate stand by at the placement buffer based on timing at which the exposure device can accept each substrate; and making each substrate stand by at the placement buffer based on timing at which the developing device can accept each substrate.

    Abstract translation: 在每个基板上形成感光膜之后处理多个基板的方法包括：通过第一输送机构将每个基板运送到包括多个支撑件的放置缓冲器中; 通过第二传送机构将每个基板从放置缓冲器取出到界面; 将每个衬底携带到曝光装置中; 通过第二传送机构将每个基板从曝光装置移出到放置缓冲器中; 通过第一传送机构将每个基板从放置缓冲器取出到处理部分; 对各基板进行显影处理; 基于曝光装置可以接受每个基板的定时使每个基板在放置缓冲器处待机; 并且基于显影装置可以接受每个基板的定时使每个基板在放置缓冲器处待机。

    OUTPUT CIRCUIT AND OUTPUT CONTROL SYSTEM
    4.
    发明申请
    OUTPUT CIRCUIT AND OUTPUT CONTROL SYSTEM 失效
    输出电路和输出控制系统

    公开(公告)号：US20120229164A1

    公开(公告)日：2012-09-13

    申请号：US13235953

    申请日：2011-09-19

    Applicant: Takashi Taguchi ,  Hiroyuki Ideno

    Inventor： Takashi Taguchi ,  Hiroyuki Ideno

    IPC: H03K19/0175

    CPC classification number: H03K19/018521 ,  H03K3/35613 ,  H03K19/09429

    Abstract: An output circuit which outputs an output signal based on an input signal from an output terminal and brings the output terminal into a high impedance state in response to an impedance control signal. The output circuit includes an output pMOS transistor connected at a source thereof to a first power supply. The output circuit includes an output nMOS transistor connected between a drain of the output pMOS transistor and ground. The output circuit includes an output terminal connected between the drain of the output pMOS transistor and a drain of the output nMOS transistor. The output circuit includes a first level shifter circuit which outputs a first gate control signal from a first gate control terminal to control on/off of the output pMOS transistor. The output circuit includes a second level shifter circuit which outputs a second gate control signal from a second gate control terminal to control on/off of the output nMOS transistor.

    Abstract translation: 输出电路，其根据来自输出端子的输入信号输出输出信号，并根据阻抗控制信号使输出端子成为高阻抗状态。 输出电路包括在其源极处连接到第一电源的输出pMOS晶体管。 输出电路包括连接在输出pMOS晶体管的漏极和地之间的输出nMOS晶体管。 输出电路包括连接在输出pMOS晶体管的漏极和输出nMOS晶体管的漏极之间的输出端子。 输出电路包括第一电平移位器电路，其输出来自第一栅极控制端子的第一栅极控制信号以控制输出pMOS晶体管的导通/截止。 输出电路包括第二电平移位器电路，其输出来自第二栅极控制端子的第二栅极控制信号以控制输出nMOS晶体管的导通/截止。

    Substrate processing apparatus and substrate processing method
    5.
    发明申请
    Substrate processing apparatus and substrate processing method 审中-公开
    基板加工装置及基板处理方法

    公开(公告)号：US20060147201A1

    公开(公告)日：2006-07-06

    申请号：US11294877

    申请日：2005-12-06

    Applicant: Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Koji Kaneyama ,  Tsuyoshi Okumura

    Inventor： Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Koji Kaneyama ,  Tsuyoshi Okumura

    IPC: G03D5/00

    CPC classification number: G03F7/70991 ,  G03F7/70341

    Abstract: An interface transport mechanism employs an upper hand during the transport of a substrate to an exposure device, and employs a lower hand during the transport of the substrate that has been carried out of the exposure device. A fifth central robot employs a lower hand during the transport of a substrate after the exposure processing by an exposure device, and employs an upper hand during the transport of a substrate after the drying processing that has been carried out of a drying processing group. That is, the upper hand is employed to transport a substrate to which no liquid is attached, and the lower hand is employed to transport a substrate to which a liquid is attached after the exposure processing.

    Abstract translation: 接口传送机构在将基板传送到曝光装置期间采用上手，并且在已经从曝光装置执行的基板的传送期间使用下手。 第五中央机器人在通过曝光装置进行曝光处理之后的基板传送期间使用下手，并且在从干燥处理组进行的干燥处理之后的基板的输送过程中采用上手。 也就是说，上面用于输送没有附着液体的基板，并且在曝光处理之后使用下手来输送附着有液体的基板。

    Dispensing carton for a roll film
    8.
    发明授权
    Dispensing carton for a roll film 失效
    分配卷筒纸

    公开(公告)号：US5078311A

    公开(公告)日：1992-01-07

    申请号：US711552

    申请日：1991-05-20

    Applicant: Takashi Taguchi ,  Yorio Takemura

    Inventor： Takashi Taguchi ,  Yorio Takemura

    IPC: B65D5/72 ,  B65D83/08 ,  B65D85/672 ,  B65H35/00

    CPC classification number: B65H35/0006 ,  B65D83/0841 ,  B65D83/0882 ,  B65D85/672 ,  B65H2701/1752 ,  Y10T225/243 ,  Y10T225/251 ,  Y10T225/298

    Abstract: A dispensing carton in which a film wound cylindrically is contained includes a bottom panel, a rear panel, a front panel, both side panels, a lid member which is hingedly joined to the rear panel, a front flange joined to an end of the lid member to overlap the front panel when said lid member is closed, and a cutter mounted along an end of the front flange. The front flange includes a convex edge including, for example, a V-shaped edge. A saw-tooth edge of the cutter mounted along the end of the front flange is arranged into a convex shape such as V-shape. A length from the tip of at least one tooth of the saw-tooth edge nearest to a base of the box to the bottom of a gullet adjacent to the tooth is longer than a length from the tip of other teeth to the bottom of gullets adjacent to the other teeth. When the film is pulled out of the carton and further pulled in the horizontal direction or twisted while being pulled, the tooth of the cutter nearest to the base of the box first cuts into the film. Then, when the film is further pulled, the cut of the film is extended along the arrangement of teeth of the saw-tooth edge so that film is cut easily and completely while keeping the film spread horizontally.

    Heat rays reflecting film
    9.
    发明授权
    Heat rays reflecting film 失效
    热射线反射膜

    公开(公告)号：US4461532A

    公开(公告)日：1984-07-24

    申请号：US372827

    申请日：1982-04-28

    Applicant: Susumu Sato ,  Tadashi Hattori ,  Yoshiki Ueno ,  Takashi Taguchi

    Inventor： Susumu Sato ,  Tadashi Hattori ,  Yoshiki Ueno ,  Takashi Taguchi

    IPC: E06B9/24 ,  B32B7/02 ,  C03C17/34 ,  G02B5/28 ,  G02B5/22

    CPC classification number: G02B5/282

    Abstract: A heat rays reflecting film composed of dielectric thin layers (n.sub.H layers) having a relatively high refractive index and dielectric thin layers (n.sub.L layers) having a relatively low refractive index which are alternately piled on one another, is disclosed. The first layer of the heat rays reflecting film, which contacts with the air is n.sub.L layer and the undermost layer which contacts with the window glass is n.sub.H layer. The optical thickness of the first layer is less than .lambda./4 while that of the other layers is .lambda./4. And the thickness of each layer is expressed by the formula: optical thickness/nv wherein nv is the refractive index for visible rays.

    Abstract translation: 公开了一种由具有较高折射率的电介质薄层（nH层）和具有较低折射率的电介质薄层（nL层）组成的热射线反射膜，它们彼此交替堆叠。 与空气接触的热射线反射膜的第一层为nL层，与窗玻璃接触的最下层为nH层。 第一层的光学厚度小于λ/ 4，而其他层的光学厚度为λ/ 4。 并且每层的厚度由下式表示：光学厚度/ nv，其中nv是可见光的折射率。

    Substrate processing apparatus and substrate processing system
    10.
    发明授权
    Substrate processing apparatus and substrate processing system 有权

    公开(公告)号：US09606454B2

    公开(公告)日：2017-03-28

    申请号：US14022657

    申请日：2013-09-10

    Applicant: Takashi Taguchi ,  Joji Kuwahara

    Inventor： Takashi Taguchi ,  Joji Kuwahara

    IPC: G03B27/42 ,  G03F7/20

    CPC classification number: G03F7/70691 ,  G03F7/70733

    Abstract: A substrate processing apparatus includes a processing section and an exposure transport section. The exposure transport section includes a horizontal transport region and a plurality of vertical transport regions in a casing. The horizontal transport region is provided at the upper portion of the casing to extend in the X direction. A plurality of exposure devices are arranged below the horizontal transport region to be lined up in the X direction. A transport mechanism is provided in the horizontal transport region. The transport mechanism is configured to be capable of transporting a substrate between the processing section and the plurality of exposure devices.

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