发明授权
- 专利标题： Structural member to be used in apparatus for manufacturing semiconductor or flat display, and method for producing the same
- 专利标题（中）： 用于制造半导体或平板显示器的装置中的结构件及其制造方法
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申请号： US12521387申请日： 2007-12-21
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公开(公告)号： US08642187B2公开(公告)日： 2014-02-04
- 发明人: Tadahiro Ohmi , Minoru Tahara , Yasuhiro Kawase
- 申请人： Tadahiro Ohmi , Minoru Tahara , Yasuhiro Kawase
- 申请人地址： JP Sendai-shi JP Tokyo
- 专利权人： National University Corporation Tohoku University,Mitsubishi Chemical Corporation
- 当前专利权人： National University Corporation Tohoku University,Mitsubishi Chemical Corporation
- 当前专利权人地址： JP Sendai-shi JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2006-355642 20061228
- 国际申请： PCT/JP2007/074636 WO 20071221
- 国际公布： WO2008/081748 WO 20080710
- 主分类号： B32B15/00
- IPC分类号： B32B15/00 ; B32B15/01 ; B32B15/04 ; B32B15/10 ; B32B9/00 ; B32B19/00
摘要：
A structural member for a manufacturing apparatus has a metal base member mainly composed of aluminum, a high-purity aluminum film formed on the surface of the metal base member, and a nonporous amorphous aluminum oxide passivation film which is formed by anodizing the high-purity aluminum film. A method for producing a structural member for a manufacturing apparatus, includes forming a high-purity aluminum film on the surface of a metal base member mainly composed of aluminum, and anodizing the high-purity aluminum film in a chemical conversion liquid having a pH of 4-10 and containing a nonaqueous solvent, which has a dielectric constant lower than that of water and dissolves water, thereby converting at least a surface portion of the high-purity aluminum film into a nonporous amorphous aluminum oxide passivation film.
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