Invention Grant
- Patent Title: Memory device and method of fabricating the same
- Patent Title (中): 存储器件及其制造方法
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Application No.: US13784346Application Date: 2013-03-04
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Publication No.: US08647988B2Publication Date: 2014-02-11
- Inventor: Ying Cheng Chuang , Ping Cheng Hsu , Sheng Wei Yang , Ming Cheng Chang , Hung Ming Tsai
- Applicant: Nanya Technology Corporation
- Applicant Address: TW Tao-Yuan Hsien
- Assignee: Nanya Technology Corporation
- Current Assignee: Nanya Technology Corporation
- Current Assignee Address: TW Tao-Yuan Hsien
- Agency: WPAT, P.C.
- Agent Anthony King
- Main IPC: H01L21/311
- IPC: H01L21/311

Abstract:
A memory device includes a mesa structure and a word line. The mesa structure, having two opposite side surfaces, includes at least one pair of source/drain regions and at least one channel base region corresponding to the pair of source/drain regions formed therein. The word line includes two linear sections and at least one interconnecting portion. Each linear section extends on the respective side surface of the mesa structure, adjacent to the channel base region. The at least one interconnecting portion penetrates through the mesa structure, connecting the two linear sections.
Public/Granted literature
- US20130183808A1 MEMORY DEVICE AND METHOD OF FABRICATING THE SAME Public/Granted day:2013-07-18
Information query
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