Invention Grant
- Patent Title: Emitting device and manufacturing method therefor
- Patent Title (中): 发光装置及其制造方法
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Application No.: US13273165Application Date: 2011-10-13
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Publication No.: US08653501B2Publication Date: 2014-02-18
- Inventor: Tetsuya Takeuchi , Tatsuro Uchida , Mitsuhiro Ikuta
- Applicant: Tetsuya Takeuchi , Tatsuro Uchida , Mitsuhiro Ikuta
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper and Scinto
- Priority: JP2010-135137 20100614
- Main IPC: H01L33/04
- IPC: H01L33/04

Abstract:
Provided is an emitting device which is capable of improving the luminous efficiency of an emitting layer formed using a group IV semiconductor material and obtaining an emission spectrum having a narrow band, and a manufacturing method therefor. The emitting device comprises: an emitting layer having a potential confinement structure, comprising: a well region comprising a group IV semiconductor material; and a barrier region being adjacent to the well region and comprising a group IV semiconductor material which is different from the group IV semiconductor material in the well region, wherein: a continuous region from the well region over an interface between the well region and the barrier region to a part of the barrier region comprises fine crystals; and a region in the barrier region, which is other than the continuous region comprising the fine crystals, is amorphous or polycrystalline region.
Public/Granted literature
- US20120032143A1 EMITTING DEVICE AND MANUFACTURING METHOD THEREFOR Public/Granted day:2012-02-09
Information query
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