Invention Grant
- Patent Title: Electronic device and method for manufacturing same
- Patent Title (中): 电子装置及其制造方法
-
Application No.: US13582611Application Date: 2011-03-31
-
Publication No.: US08653519B2Publication Date: 2014-02-18
- Inventor: Tsutomu Ichihara , Kenji Tsubaki , Masao Kubo , Nobuyoshi Koshida
- Applicant: Tsutomu Ichihara , Kenji Tsubaki , Masao Kubo , Nobuyoshi Koshida
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JP2010-083862 20100331
- International Application: PCT/JP2011/058264 WO 20110331
- International Announcement: WO2011/125859 WO 20111013
- Main IPC: H01L29/04
- IPC: H01L29/04

Abstract:
The electronic device includes a substrate, a first electrode formed over a surface of the substrate, a second electrode located on an opposite side of the first electrode from the substrate so as to face the first electrode, and a functional layer interposed between the first electrode and second electrode and formed by means of anodizing a first polycrystalline semiconductor layer in an electrolysis solution so as to contain a plurality of semiconductor nanocrystals. The electronic device further includes a second polycrystalline semiconductor layer interposed between the first electrode and the functional layer so as to be in close contact with the functional layer. The second polycrystalline semiconductor layer has an anodic oxidization rate in the electrolysis solution lower than that of the first polycrystalline semiconductor layer so as to function as a stop layer for exclusively anodizing the first polycrystalline semiconductor layer.
Public/Granted literature
- US20130032801A1 ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2013-02-07
Information query
IPC分类: