Invention Grant
US08654490B2 High voltage electrostatic discharge clamp using deep submicron CMOS technology
有权
采用深亚微米CMOS技术的高压静电放电钳
- Patent Title: High voltage electrostatic discharge clamp using deep submicron CMOS technology
- Patent Title (中): 采用深亚微米CMOS技术的高压静电放电钳
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Application No.: US13398638Application Date: 2012-02-16
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Publication No.: US08654490B2Publication Date: 2014-02-18
- Inventor: Dejun Wang
- Applicant: Dejun Wang
- Applicant Address: US CA Lake Forest
- Assignee: Newport Media, Inc.
- Current Assignee: Newport Media, Inc.
- Current Assignee Address: US CA Lake Forest
- Agency: Rahman LLC
- Main IPC: H02H9/00
- IPC: H02H9/00

Abstract:
An ESD circuit includes a plurality of MOS devices arranged in a stack, wherein each of the MOS devices comprises a source, a drain, and a gate; a voltage source inputting a supply voltage to the stack of MOS devices; a first plurality of resistors dividing the supply voltage to each source and each drain of the MOS devices in the stack; a second plurality of resistors biasing the supply voltage to each gate of the MOS devices in the stack; an inverter device operatively connected to the second plurality of resistors; a time lag circuit that turns the inverter device on and off; and a plurality of capacitors pulling the voltage to each gate of the MOS devices in the stack to the supply voltage upon the inverter device turning off.
Public/Granted literature
- US20130215540A1 High Voltage Electrostatic Discharge Clamp Using Deep Submicron CMOS Technology Public/Granted day:2013-08-22
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