Invention Grant
US08654490B2 High voltage electrostatic discharge clamp using deep submicron CMOS technology 有权
采用深亚微米CMOS技术的高压静电放电钳

  • Patent Title: High voltage electrostatic discharge clamp using deep submicron CMOS technology
  • Patent Title (中): 采用深亚微米CMOS技术的高压静电放电钳
  • Application No.: US13398638
    Application Date: 2012-02-16
  • Publication No.: US08654490B2
    Publication Date: 2014-02-18
  • Inventor: Dejun Wang
  • Applicant: Dejun Wang
  • Applicant Address: US CA Lake Forest
  • Assignee: Newport Media, Inc.
  • Current Assignee: Newport Media, Inc.
  • Current Assignee Address: US CA Lake Forest
  • Agency: Rahman LLC
  • Main IPC: H02H9/00
  • IPC: H02H9/00
High voltage electrostatic discharge clamp using deep submicron CMOS technology
Abstract:
An ESD circuit includes a plurality of MOS devices arranged in a stack, wherein each of the MOS devices comprises a source, a drain, and a gate; a voltage source inputting a supply voltage to the stack of MOS devices; a first plurality of resistors dividing the supply voltage to each source and each drain of the MOS devices in the stack; a second plurality of resistors biasing the supply voltage to each gate of the MOS devices in the stack; an inverter device operatively connected to the second plurality of resistors; a time lag circuit that turns the inverter device on and off; and a plurality of capacitors pulling the voltage to each gate of the MOS devices in the stack to the supply voltage upon the inverter device turning off.
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