发明授权
- 专利标题： Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same
- 专利标题（中）： 含有可聚合阴离子的含氟磺酸盐及其制造方法，含氟树脂，抗蚀剂组合物和使用其的图案形成方法
-
申请号： US13121315申请日： 2009-10-08
-
公开(公告)号： US08663897B2公开(公告)日： 2014-03-04
- 发明人: Takashi Masubuchi , Kazunori Mori , Yuji Hagiwara , Satoru Narizuka , Kazuhiko Maeda
- 申请人： Takashi Masubuchi , Kazunori Mori , Yuji Hagiwara , Satoru Narizuka , Kazuhiko Maeda
- 申请人地址： JP Ube-shi
- 专利权人： Central Glass Company, Limited
- 当前专利权人： Central Glass Company, Limited
- 当前专利权人地址： JP Ube-shi
- 代理机构： Crowell & Moring LLP
- 优先权： JP2008-268476 20081017
- 国际申请： PCT/JP2009/067567 WO 20091008
- 国际公布： WO2010/044372 WO 20100422
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/30 ; C07C303/32 ; C07C309/20 ; C08F220/24 ; G03F7/039
摘要：
According to the present invention, there is provided a polymerizable fluorine-containing sulfonic acid onium salt of the following general formula (2) and a resin obtained by polymerization thereof. It is possible by the use of this sulfonate resin of the present invention to provide a resist composition with high resolution, board depth of focus tolerance (DOF), small line edge roughness (LER) and high sensitivity. In the formula, Z represents a substituted or unsubstituted C1-C6 straight or branched alkylene group, or a divalent moiety in which substituted or unsubstituted C1-C6 straight or branched alkylene groups are bonded in series to a divalent group obtained by elimination of two hydrogen atoms from an alicyclic or aromatic hydrocarbon; R represents a hydrogen atom, a halogen atom, or a C1-C3 alkyl or fluorine-containing alkyl group; and Q+ represents a sulfonium cation or an iodonium cation.
公开/授权文献
信息查询
IPC分类:
